Thomas A Mchugh

US Patent:

54746477, Dec 12, 1995

Filed:

Nov 15, 1993

Appl. No.:

8/153236

Inventors:

Sherman K. Poultney - Ridgefield CT
Peter B. Mumola - Huntington CT
Joseph P. Prusak - Danbury CT
George J. Gardopee - Southbury CT
Thomas J. McHugh - Bethel CT

Assignee:

Hughes Aircraft Company - Los Angeles CA

International Classification:

H01L 2100

US Classification:

1566261

Abstract:

A method for controlling the flow of semiconductor wafers within a semiconductor wafer processing facility. This method includes a wafer storage and preparation area (10) and a wafer metrology and etch area (12), both of which are monitored and/or controlled by a master controller (14). The wafer storage and preparation area (10) is typically kept at a class 10 clean room level and is comprised of a wafer storage area (16) and a wafer preparation area (18). The wafer metrology and etch area (12) is typically kept at a class 1000 clean room level and is comprised of an I/O cassette module (22), a wafer pre-aligner (24), a wafer router (26), a wafer metrology instrument (28), and a wafer etching instrument (30). The semiconductor wafers are transported, either manually or automatically, between the wafer storage area (16) and the wafer preparation area (18), as well as between the wafer storage and preparation area (10) and the wafer metrology and etch area (12), within wafer storage cassettes ( 20). The semiconductor wafers are individually transported between the I/O cassette module (22), the wafer pre-aligner (24), the wafer metrology instrument (28), and the wafer etching instrument (30) by the wafer router (26).