Alex N Hegyi from 12 Winfield St, San Francisco, CA 94110, age 38

Resumes

Co-Founder

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Location:

Berkeley, CA

Industry:

Research

Work:

Stealth
Co-Founder
Parc
Senior Member Research Staff

Education:

University of California, Berkeley 2008 - 2013
Master of Science, Doctorates, Masters, Doctor of Philosophy Stanford University 2004 - 2008
Bachelors, Bachelor of Science

Skills:

Research
Development

Alex Hegyi

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Software Engineer - Serco

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Location:

450 Hotchkiss St, Campbellsville, KY 42718

Industry:

Defense & Space

Work:

Shore To Shore 2004 - 2006
Software Developer
North America 2004 - 2006
Software Engineer - Serco
Serco 2004 - 2006
Software Engineer at Serco - North America

Name / Title

Company / Classification

Phones & Addresses

Alex T. Hegyi

MAPATIVE TECHNOLOGIES LLC

Us Patents

Obtaining Information From Time Variation Of Sensing Results
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US Patent:

7817254, Oct 19, 2010
Filed:

Jan 30, 2008
Appl. No.:

12/022485
Inventors:

Alex Hegyi - Ann Arbor MI, US
Michael Bassler - Menlo Park CA, US
Peter Kiesel - Palo Alto CA, US
Noble M. Johnson - Menlo Park CA, US
Assignee:

Palo Alto Research Center Incorporated - Palo Alto CA
International Classification:

G01P 3/36
US Classification:

356 28, 356 501, 356 515, 356 285
Abstract:

Sensing results from moving objects, e. g. from photosensing emanating light or from impedance-based sensing, can indicate sensed time-varying waveforms with information about objects. For example, a sensed time-varying waveform can be compared with another waveform, such as a reference waveform produced by objects of a certain type, to obtain comparison results indicating motion-independent information about the object; time-scaling can adjust for displacement rate such as speed. Also, a modulation periodicity value can be obtained from a sensed time-varying waveform and used in obtaining information about an object; for example, a periodic modulation frequency can be used with a given time's chirp frequency to obtain phase information about an object's position. Or, where periodic modulation frequency indicates displacement rate, time scaling during comparison can use a scaling factor based on the frequency. Objects can move fluidically as in flow cytometry or through scanning movement, as in document scanning.

Producing Filters With Combined Transmission And/Or Reflection Functions
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US Patent:

7894068, Feb 22, 2011
Filed:

Feb 4, 2008
Appl. No.:

12/025394
Inventors:

Michael Bassler - Menlo Park CA, US
Peter Kiesel - Palo Alto CA, US
Markus Beck - Palo Alto CA, US
Alex Hegyi - Ann Arbor MI, US
Tobias Buergel - Braunschweig, DE
Noble M. Johnson - Menlo Park CA, US
Assignee:

Palo Alto Research Center Incorporated - Palo Alto CA
International Classification:

G01N 21/25
G01N 21/00
G01N 21/55
US Classification:

356419, 356410, 356432, 356445
Abstract:

A transmissive and/or reflective optical filter can receive input light, which can emanate from objects traveling along paths past the filter, e. g. from biological cells, viruses, colored spots or other markings on documents, and so forth. In response, the filter can provide output light in accordance with a combined transmission function that is approximately equal to a superposition or scaled superposition of a set of simpler transmission functions. The set can include two or more non-uniform transmission functions, a subset of which can be different from each other and positioned relative to each other so that the output light has time variation in accordance with each of the functions in the subset. The subset could include, for example, a random function and a periodic function, a chirp function and a periodic function, or any other suitable combination of two or more simpler functions.

Photo-Mask And Wafer Image Reconstruction
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US Patent:

8200002, Jun 12, 2012
Filed:

May 29, 2009
Appl. No.:

12/475369
Inventors:

Moshe E. Preil - Sunnyvale CA, US
Alex N. Hegyi - Ann Arbor MI, US
Daniel S. Abrams - Palo Alto CA, US
Assignee:

Luminescent Technologies, Inc. - Palo Alto CA
International Classification:

G06K 9/36
US Classification:

382144
Abstract:

A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.

Photo-Mask And Wafer Image Reconstruction
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US Patent:

8204295, Jun 19, 2012
Filed:

May 29, 2009
Appl. No.:

12/475354
Inventors:

Moshe E. Preil - Sunnyvale CA, US
Alex N. Hegyi - Ann Arbor MI, US
Daniel S. Abrams - Palo Alto CA, US
Assignee:

Luminescent Technologies, Inc. - Palo Alto CA
International Classification:

G06K 9/36
US Classification:

382144
Abstract:

A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.

Photo-Mask And Wafer Image Reconstruction
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US Patent:

8260032, Sep 4, 2012
Filed:

May 29, 2009
Appl. No.:

12/475338
Inventors:

Moshe E. Preil - Sunnyvale CA, US
Alex N. Hegyi - Ann Arbor MI, US
Daniel S. Abrams - Palo Alto CA, US
Assignee:

Luminescent Technologies, Inc. - Palo Alto CA
International Classification:

G06K 9/36
US Classification:

382144
Abstract:

A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.

Photo-Mask And Wafer Image Reconstruction
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US Patent:

8280146, Oct 2, 2012
Filed:

May 29, 2009
Appl. No.:

12/475361
Inventors:

Moshe E. Preil - Sunnyvale CA, US
Alex N. Hegyi - Ann Arbor MI, US
Daniel S. Abrams - Palo Alto CA, US
Assignee:

Luminescent Technologies, Inc. - Palo Alto CA
International Classification:

G06K 9/36
US Classification:

382144
Abstract:

A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.

Photo-Mask And Wafer Image Reconstruction
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US Patent:

8331645, Dec 11, 2012
Filed:

May 29, 2009
Appl. No.:

12/475349
Inventors:

Moshe E. Preil - Sunnyvale CA, US
Alex N. Hegyi - Ann Arbor MI, US
Daniel S. Abrams - Palo Alto CA, US
Assignee:

Luminescent Technologies, Inc. - Palo Alto CA
International Classification:

G06K 9/36
US Classification:

382144
Abstract:

A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.

Photo-Mask And Wafer Image Reconstruction
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US Patent:

8644588, Feb 4, 2014
Filed:

Sep 19, 2007
Appl. No.:

12/440722
Inventors:

Moshe E. Preil - Sunnyvale CA, US
Alex N. Hegyi - Ann Arbor MI, US
Daniel S. Abrams - Palo Alto CA, US
Assignee:

Luminescent Technologies, Inc. - Palo Alto CA
International Classification:

G06K 9/00
US Classification:

382144, 356 301, 382145, 382218, 430 5
Abstract:

A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.