Chun D Liu

US Patent:

6393692, May 28, 2002

Filed:

Apr 1, 1999

Appl. No.:

09/283840

Inventors:

Kochan Ju - Fremont CA
Po-Kang Wang - San Jose CA
Chun Liu - Fremont CA

Assignee:

Headway Technologies, Inc. - Milpitas CA

International Classification:

H04R 3100

US Classification:

2960314, 2960315

Abstract:

A merged read/write magnetic recording head comprises a low magnetic moment first magnetic shield layer over a substrate. A read gap layer with a magnetoresistive head is formed over the first shield layer. A shared pole comprises a low magnetic moment second magnetic shield layer plated on a sputtered seed PLM layer over the read gap layer, a non-magnetic layer plated over the PLM layer and a HMM lower pole layer plated over the second magnetic shield layer. A write gap layer is formed over the first high magnetic moment pole layer of the shared pole. An upper pole comprises a high magnetic moment pole layer over the write gap layer.

US Patent:

6524491, Feb 25, 2003

Filed:

Apr 26, 1999

Appl. No.:

09/298935

Inventors:

Chun Liu - Fremont CA
Kochan Ju - Fremont CA
Po-Kang Wang - San Jose CA

Assignee:

Headway Technologies, Inc. - Milpitas CA

International Classification:

G11B 5127

US Classification:

216 22, 216 38, 216 57, 216 66, 2960301, 2960307, 360317

Abstract:

A method of manufacturing a magnetic recording head includes the following steps. Form a low magnetic moment, first magnetic shield layer over a substrate. Form a read gap layer with a magnetoresistive head over the first shield layer. Form a seed layer over the read gap layer covered with a frame mask with a width âFâ. Form a PLM second shield layer over the seed layer and planarize the shield layer. Form a non-magnetic copper or dielectric spacer layer over the PLM second shield layer. Form a first HMM, lower pole layer over the non-magnetic spacer layer. Cover the first HMM, lower pole layer with a write gap layer. Form an write head mask composed of two parallel rows of resist with an outer width âWâ over the seed layer. Between the two rows of resist of the write head mask is a trench having a width âNâ. Then form an HMM, upper pole layer over the write gap layer aside from the write head mask.

US Patent:

7012789, Mar 14, 2006

Filed:

Apr 24, 2002

Appl. No.:

10/131675

Inventors:

Kochan Ju - Fremont CA, US
Po-Kang Wang - San Jose CA, US
Chun Liu - Fremont CA, US
Jei Wei Chang - Cupertino CA, US

Assignee:

Headway Technologies, Inc. - Milpitas CA

International Classification:

G11B 5/127

US Classification:

360317

Abstract:

A merged read/write magnetic recording head comprises a low magnetic moment first magnetic shield layer over a substrate. A read gap layer with a magnetoresistive head is formed over the first shield layer. A shared pole comprises a low magnetic moment second magnetic shield layer plated on a sputtered seed PLM layer over the read gap layer, a non-magnetic layer plated over the PLM layer and a HMM lower pole layer plated over the second magnetic shield layer. A write gap layer is formed over the first high magnetic moment pole layer of the shared pole. An upper pole comprises a high magnetic moment pole layer over the write gap layer.

Address:

35 W Camino Real Ave, Arcadia, CA 91007

Phone:

6262540868

VIN:

WBAVC53547FZ72187

Make:

BMW

Model:

3 SERIES

Year:

2007