Edward Sather North

US Patent:

6573702, Jun 3, 2003

Filed:

Sep 12, 1997

Appl. No.:

08/928806

Inventors:

Arno G. Marcuse - Tempe AZ
Robert A. Most - Newfoundland NJ
Edward S. North - Los Altos CA

Assignee:

New Wave Research - Fremont CA

International Classification:

G01R 1073

US Classification:

3241581, 134 1, 134 5, 324757

Abstract:

A method and device for cleaning an electrical contact. Semiconductor testing device. Process of manufacturing integrated circuits. The electrical contact is used for contacting an integrated circuit and accumulates debris during use. The method comprises directing electromagnetic radiation at the contact. The electromagnetic energy reacts with at least one of the contact and the debris so as to cause at least a portion of the debris on the contact to be removed. The electromagnetic radiation may comprise coherent radiation, such as electromagnetic radiation generated using a laser. The portion of the debris may comprise organic debris, aluminum oxide, polyimide, or other debris. According to one aspect of the invention, the contact comprises a conductive material and the electromagnetic radiation causes removal of the portion of the debris substantially without removal of the conductive material. According to another aspect of the invention, the electromagnetic radiation at least partially melts the conductive material. In one preferred system, the contact comprises a probe tip.

US Patent:

59633646, Oct 5, 1999

Filed:

Oct 14, 1997

Appl. No.:

8/949962

Inventors:

Tony P. Leong - San Jose CA
Edward S. North - Los Altos CA
Richard Linsley Herbst - Palo Alto CA

Assignee:

New Wave Research - Sunnyvale CA

International Classification:

G02B 530

US Classification:

359352

Abstract:

A probe station which comprises a base machine, a chuck mounted on the base machine to hold a device under test (DUT), a probe platen mounted on the base machine on which to mount probes for the device, a microscope mounted on the base machine having a field of view on the DUT on the chuck, and a single laser, mounted with the microscope. The single laser supplies an output beam in a plurality of wavelengths through the microscope optics on a beam line to the field of view of the microscope. The laser system includes a solid state laser, a harmonic generator coupled with the solid state laser, and switchable optics for selecting the wavelength of the output beam from among two or more selectable wavelengths. In addition, the laser system includes a variable attenuator, based on a unique half-wave plate, which operates for the plurality of wavelengths which are selectable as outputs in the infrared (1064 nanometers), in the green (532 nanometers), and in the ultraviolet (355 nanometers, or 266 nanometers). These wavelengths correspond to the fundamental output wavelength of the Nd:YAG laser, the second harmonic, and either the third or fourth harmonic of the laser.

US Patent:

57037132, Dec 30, 1997

Filed:

May 31, 1995

Appl. No.:

8/455509

Inventors:

Tony P. Leong - San Jose CA
Edward S. North - Los Altos CA
Richard Linsley Herbst - Palo Alto CA

Assignee:

New Wave Research - Sunnyvale CA

International Classification:

G02B 530
G02B 2728

US Classification:

359352

Abstract:

A probe station which comprises a base machine, a chuck mounted on the base machine to hold a device under test (DUT), a probe platen mounted on the base machine on which to mount probes for the device, a microscope mounted on the base machine having a field of view on the DUT on the chuck, and a single laser, mounted with the microscope. The single laser supplies an output beam in a plurality of wavelengths through the microscope optics on a beam line to the field of view of the microscope. The laser system includes a solid state laser, a harmonic generator coupled with the solid state laser, and switchable optics for selecting the wavelength of the output beam from among two or more selectable wavelengths. In addition, the laser system includes a variable attenuator, based on a unique half-wave plate, which operates for the plurality of wavelengths which are selectable as outputs in the infrared (1064 nanometers), in the green (532 nanometers), and in the ultraviolet (355 nanometers, or 266 nanometers). These wavelengths correspond to the fundamental output wavelength of the Nd:YAG laser, the second harmonic, and either the third or fourth harmonic of the laser.

US Patent:

58117512, Sep 22, 1998

Filed:

Jan 24, 1997

Appl. No.:

8/789591

Inventors:

Tony P. Leong - San Jose CA
Edward S. North - Los Altos CA
Richard Linsley Herbst - Palo Alto CA

Assignee:

New Wave Research - Sunnyvale CA

International Classification:

B23K 2600

US Classification:

2191216

Abstract:

A probe station which comprises a base machine, a chuck mounted on the base machine to hold a device under test (DUT), a probe platen mounted on the base machine on which to mount probes for the device, a microscope mounted on the base machine having a field of view on the DUT on the chuck, and a single laser, mounted with the microscope. The single laser supplies an output beam in a plurality of wavelengths through the microscope optics on a beam line to the field of view of the microscope. The laser system includes a solid state laser, a harmonic generator coupled with the solid state laser, and switchable optics for selecting the wavelength of the output beam from among two or more selectable wavelengths. In addition, the laser system includes a variable attenuator, based on a unique half-wave plate, which operates for the plurality of wavelengths which are selectable as outputs in the infrared (1064 nanometers), in the green (532 nanometers), and in the ultraviolet (355 nanometers, or 266 nanometers). These wavelengths correspond to the fundamental output wavelength of the Nd:YAG laser, the second harmonic, and either the third or fourth harmonic of the laser.

US Patent:

56119461, Mar 18, 1997

Filed:

Feb 18, 1994

Appl. No.:

8/199389

Inventors:

Tony P. Leong - San Jose CA
Edward S. North - Los Altos CA
Richard L. Herbst - Palo Alto CA

Assignee:

New Wave Research - Sunnyvale CA

International Classification:

B23K 2600

US Classification:

2191216

Abstract:

A probe station which comprises a base machine, a chuck mounted on the base machine to hold a device under test (DUT), a probe platen mounted on the base machine on which to mount probes for the device, a microscope mounted on the base machine having a field of view on the DUT on the chuck, and a single laser, mounted with the microscope. The single laser supplies an output beam in a plurality of wavelengths through the microscope optics on a beam line to the field of view of the microscope. The laser system includes a solid state laser, a harmonic generator coupled with the solid state laser, and switchable optics for selecting the wavelength of the output beam from among two or more selectable wavelengths. In addition, the laser system includes a variable attenuator, based on a unique half-wave plate, which operates for the plurality of wavelengths which are selectable as outputs in the infrared (1064 nanometers), in the green (532 nanometers), and in the ultraviolet (355 nanometers, or 266 nanometers). These wavelengths correspond to the fundamental output wavelength of the Nd:YAG laser, the second harmonic, and either the third or fourth harmonic of the laser.