3801 Vincent Dr, Collegeville, PA 19426 • 6104893758
742 Darlington Dr, Old Bridge, NJ 08857 • 7326071467
Norristown, PA
Ocean, NJ
Tuscaloosa, AL
Chula Vista, CA
Work
Company:
J.p. morgan chase bank
Jul 2010
Position:
Vice-president
Education
School / High School:
University of Texas at Austin- Austin, TX
2001
Specialities:
PhD in Physics
Skills
commodities • c++ • derivatives pricing • risk management • credit risk • stochastic • Monte Carlo • time series analysis • python • trading system • exotics • energy • power
Gladinet Inc since Sep 2008
Testing
Alcatel-Lucent Apr 1999 - Aug 2008
MTS
Lucent Technologies 1999 - 2008
MTS
Education:
University of Alabama 1997 - 1999
MS, Computer Science
China University of Mining and Technology 1993 - 1996
MS, Power Electronics
Xiamen University 1989 - 1993
BS, Computer Science
Jul 2010 to 2000 Vice-PresidentGOLDMAN SACHS CO. JAPAN Tokyo, JP Jun 2008 to Jul 2010 Vice-PresidentGOLDMAN SACHS CO New York, NY Dec 2007 to Jun 2008 Vice-PresidentCONSTELLATION ENERGY COMMODITY GROUP
Aug 2001 to Dec 2007 Vice-President
Education:
University of Texas at Austin Austin, TX 2001 PhD in PhysicsBeijing University 1994 BS in Physics
Skills:
commodities,c++,derivatives pricing,risk management,credit risk,stochastic,Monte Carlo,time series analysis,python,trading system,exotics,energy,power
6750 N Andrews Ave SUITE 200, Fort Lauderdale, FL 33309 1451 W Cypress Crk Rd, Fort Lauderdale, FL 33309 7107 Copperfield Cir, Lake Worth, FL 33467 5614837151
Gang Xu
WESTLAKE ES LLC
Gang Xu President
TAO-YUAN INTERNATIONAL, INC
1005 Boranda Ave #6, Mountain View, CA 94040
Gang Xu Director
Nextgate System Inc
3801 Vincent Dr, Collegeville, PA 19426
Us Patents
System And Method For Superframe Dithering In A Liquid Crystal Display
A system and method are provided for driving a digital display adapted to depict a first number of bits per color field during each frame. In use, a second number of bits is displayed which is greater than the first number of bits. This is accomplished by alternating the display of the bits between frames. To this end, additional bits of color are displayed without increasing the number of bits per color field during each frame.
Electrode And Interconnect Materials For Mems Devices
Gang Xu - Cupertino CA, US Evgeni Gousev - Saratoga CA, US
Assignee:
QUALCOMM MEMS Technologies, Inc. - San Diego CA
International Classification:
G02F 1/03 G02B 26/00
US Classification:
359245, 359290
Abstract:
A microelectromechanical (MEMS) device is presented which comprises a metallized semiconductor. The metallized semiconductor can be used for conductor applications because of its low resistivity, and for transistor applications because of its semiconductor properties. In addition, the metallized semiconductor can be tuned to have optical properties which allow it to be useful for optical MEMS devices.
Systems And Methods Of Providing A Light Guiding Layer
Russell Wayne Gruhike - Santa Clara CA, US Mark Mienko - San Jose CA, US Gang Xu - Cupertino CA, US Ion Bita - San Jose CA, US
Assignee:
QUALCOMM MEMS Technologies, Inc. - San Diego CA
International Classification:
G02B 5/02 F21V 7/04 G02B 26/00
US Classification:
359599, 362600, 362603, 362609, 362610, 359291
Abstract:
Various embodiments of the invention include an interferometric optical modulator comprising a substrate layer and a light direction layer. Such an interferometric modulator may be integrated with a diffuser layer in a display device in a way that physically integrates the diffuser layer into the light direction layer in a way where the diff-user layer does not interact with light propagating within the light direction layer. As a result, most of the light propagating within the light direction layer does not penetrate into the diffuser which would inhibit performance of the display. In some embodiments, the interface between the diffuser layer and the light direction layer has a lower index of refraction than the light direction layer and the transparent substrate so that total internal reflection occurs at the interface.
Interferometric Optical Display System With Broadband Characteristics
Evgeni Gousev - Saratoga CA, US Gang Xu - Cupertino CA, US Marek Mienko - San Jose CA, US
Assignee:
QUALCOMM MEMS Technologies, Inc. - San Diego CA
International Classification:
G02B 26/00 G02B 26/08 G02F 1/29
US Classification:
359291, 359292, 359298
Abstract:
Broad band white color can be achieved in MEMS display devices by incorporating a material having an extinction coefficient (k) below a threshold value for wavelength of light within an operative optical range of the interferometric modulator. One embodiment provides a method of making the MEMS display device comprising depositing said material over at least a portion of a transparent substrate, depositing a dielectric layer over the layer of material, forming a sacrificial layer over the dielectric, depositing an electrically conductive layer on the sacrificial layer, and forming a cavity by removing at least a portion of the sacrificial layer. The suitable material may comprise germanium, germanium alloy of various compositions, doped germanium or doped germanium-containing alloys, and may be deposited over the transparent substrate, incorporated within the transparent substrate or the dielectric layer.
Internal Optical Isolation Structure For Integrated Front Or Back Lighting
Gang Xu - Cupertino CA, US Alan Lewis - Sunnyvale CA, US Brian Gally - Los Gatos CA, US Mark Mienko - San Jose CA, US
Assignee:
QUALCOMM MEMS Technologies, Inc. - San Diego CA
International Classification:
G02B 26/00 G02F 1/29
US Classification:
359296, 359290, 359318
Abstract:
An optical isolation structure is incorporated into a display between the display elements and the transparent substrate for the display elements. The optical isolation structure reflects light rays within the substrate that impact the structure at high angles relative to normal to the structure, thereby permitting the substrate to be used as an integrated light guide for distributing light over the display from a light source on the edge of the substrate. The optical isolation structure may include a single layer having an index of refraction less than the substrate or a plurality of thin-film interference layers.
Electrode And Interconnect Materials For Mems Devices
Gang Xu - Cupertino CA, US Evgeni Gousev - Saratoga CA, US
Assignee:
QUALCOMM MEMS Technologies, Inc. - San Diego CA
International Classification:
G02F 1/03 G02B 26/00
US Classification:
359245, 359290
Abstract:
A microelectromechanical (MEMS) device is presented which comprises a metallized semiconductor. The metallized semiconductor can be used for conductor applications because of its low resistivity, and for transistor applications because of its semiconductor properties. In addition, the metallized semiconductor can be tuned to have optical properties which allow it to be useful for optical MEMS devices.
Systems And Methods Of Providing A Light Guiding Layer
Russell Wayne Gruhike - Santa Clara CA, US Mark Mienko - San Jose CA, US Gang Xu - Cupertino CA, US Ion Bita - San Jose CA, US
Assignee:
QUALCOMM MEMS Technologies, Inc. - San Diego CA
International Classification:
G02B 5/02 F21V 7/04 G02B 26/00
US Classification:
359599, 362600, 362603, 362609, 362610, 359291
Abstract:
Various embodiments of the invention include an interferometric optical modulator comprising a substrate layer and a light direction layer. Such an interferometric modulator may be integrated with a diffuser layer in a display device in a way that physically integrates the diffuser layer into the light direction layer in a way where the diff-user layer does not interact with light propagating within the light direction layer. As a result, most of the light propagating within the light direction layer does not penetrate into the diffuser which would inhibit performance of the display. In some embodiments, the interface between the diffuser layer and the light direction layer has a lower index of refraction than the light direction layer and the transparent substrate so that total internal reflection occurs at the interface.
Internal Optical Isolation Structure For Integrated Front Or Back Lighting
Gang Xu - Cupertino CA, US Alan Lewis - Sunnyvale CA, US Brian Gally - Los Gatos CA, US Mark Mienko - San Jose CA, US
Assignee:
QUALCOMM MEMS Technologies, Inc. - San Diego CA
International Classification:
G02B 26/00 G02F 1/29
US Classification:
359296, 359290, 359318
Abstract:
An optical isolation structure is incorporated into a display between the display elements and the transparent substrate for the display elements. The optical isolation structure reflects light rays within the substrate that impact the structure at high angles relative to normal to the structure, thereby permitting the substrate to be used as an integrated light guide for distributing light over the display from a light source on the edge of the substrate. The optical isolation structure may include a single layer having an index of refraction less than the substrate or a plurality of thin-film interference layers.