Michael J. Colwell - Livermore CA Jane C.T. Chiu - Sunnyvale CA Abraham F. Yee - Cupertino CA Stanley Yeh - Fremont CA Gobi R. Padmanabhan - Sunnyvale CA
Assignee:
LSI Logic Corporation - Milpitas CA
International Classification:
H01L 21265
US Classification:
437 48
Abstract:
A gate array is disclosed having a programmable polysilicon layer which serves as both the gate electrodes for MOS transistors and routing lines for some connections between gate electrodes. The gate array structure is formed on a semiconductor substrate and has an array of identical base cells located in a core region of the structure. Each such base cell includes the following elements: (1) a plurality of transistors, each of which includes a gate electrode; and (2) one or more gate connection strips formed on the substrate and electrically connecting selected gate electrodes of two or more of the transistors. Preferably, the gate connection strips are made from the same material as the selected gate electrodes (e. g. , polysilicon) and are integrally connected therewith. The gate connection strips may patterned (i. e.
Programmable Polysilicon Gate Array Base Cell Architecture
Michael J. Colwell - Fremont CA Jane C.T. Chiu - Sunnyvale CA Abraham F. Yee - Cupertino CA Stanley Wen-Chin Yeh - Fremont CA Gobi R. Padmanabhan - Sunnyvale CA
Assignee:
LSI Logic Corporation - Milpitas CA
International Classification:
H01L 2182 H01L 2704 H01L 2710
US Classification:
257206
Abstract:
A gate array is disclosed having a programmable polysilicon layer which serves as both the gate electrodes for MOS transistors and routing lines for some connections between gate electrodes. The gate array structure is formed on a semiconductor substrate and has an array of identical base cells located in a core region of the structure. Each such base cell des the following elements: (1) a plurality of transistors, each of which includes a gate electrode; and (2) one or more gate connection strips formed on the substrate and electrically connecting selected gate electrodes of two or more of the transistors. Preferably, the gate connection strips are made from the same material as the selected gate electrodes (e. g. , polysilicon) and are integrally connected therewith. The gate connection strips may patterned (i. e.