Jun Liu

US Patent:

6566541, May 20, 2003

Filed:

Mar 21, 2001

Appl. No.:

09/813555

Inventors:

Jun O. Liu - Cambridge MA
Eric C. Griffith - Somerville MA
Zhuang Su - Cambridge MA

Assignee:

Massachusetts Institute of Technology - Cambridge MA

International Classification:

C07D30308

US Classification:

549551, 549554, 549555, 549556, 549558, 549559, 549560, 514475

Abstract:

Novel compounds that are anti-angiogenic or immunosuppressive are described. Also described are methods for determining if an animal is at risk for a disease involving abnormal angiogenesis or an immune reaction resulting in pathology comprising evaluating an aspect of MetAP2 metabolism or structure; methods for identifying agents that are anti-angiogenic or immunosuppressive comprising evaluating the effect of the agent on an aspect of MetAP2 metabolism; methods for treating a cell having an abnormality in metabolism or structure of MetAP2; and methods for treating abnormal angiogenesis or an immune reaction which results in pathology in an animal. Pharmaceutical compositions are also provided.

US Patent:

6686450, Feb 3, 2004

Filed:

Jun 17, 1999

Appl. No.:

09/335011

Inventors:

Jun O. Liu - Cambridge MA
Luo Sun - Watertown MA

Assignee:

Massachusetts Institute of Technology - Cambridge MA

International Classification:

A61K 3816

US Classification:

530352, 530350

Abstract:

The present invention provides novel immunosuppressive agents. In particular, the invention provides immunosuppressive agents that bind calcineurin and/or that inhibit interaction between calcineurin and NF-AT. The invention also provides analogs of these agents, nucleic acids encoding the agents and/or their analogs, gene therapy vectors, etc. , and methods of making and using them.

US Patent:

6920398, Jul 19, 2005

Filed:

Jun 10, 2002

Appl. No.:

10/165946

Inventors:

Jun S. Liu - Weston MA, US
Zhaohui Steve Qin - Somerville MA, US
Tianhua Niu - West Roxbury MA, US

Assignee:

President and Fellows of Harvard College - Cambridge MA

International Classification:

G06F019/00

US Classification:

702 20

Abstract:

Haplotypes for phased genotypic information are determined from unphased genotypic information. One exemplary method includes separating a dataset that includes genotypic information for a plurality of markers for each of a plurality of individuals into subdatasets, each subdataset including the genotypic information for a subset of the plurality of markers; for each subdataset, identifying haplotypes compatible with marker information for each marker of the subset and for each individual of the plurality; and for each individual, assembling the haplotypes from each of the subsets to provide the individual's haplotype with respect to the plurality of markers.

US Patent:

7142707, Nov 28, 2006

Filed:

Dec 12, 2003

Appl. No.:

10/734358

Inventors:

Mohsen Abdollahi - Huntsville AL, US
Kevin H. Giles - Knoxville TN, US
Charles L. Guffey - Sweetwater TN, US
Jun Liu - Knoxville TN, US
Bernard Roche - Farragut TN, US
Peter W. Sites - Knoxville TN, US
Robert P. Whalen - Knoxville TN, US

Assignee:

Northrop Grumman Corporation - Los Angeles CA

International Classification:

G06K 9/00

US Classification:

382143, 382142, 382108, 382110

Abstract:

An apparatus in one example comprises a computer component that receives one or more images of one or more packaging materials from one or more imaging components. The computer component employs an analysis of the one or more images to make a determination of a package integrity of the one or more packaging materials.

US Patent:

7300601, Nov 27, 2007

Filed:

Dec 10, 2002

Appl. No.:

10/315641

Inventors:

Jun Liu - Brookfield CT, US
Peter Wrschka - Danbury CT, US
David Bernhard - Kooskia ID, US
MacKenzie King - Southbury CT, US
Michael Darsillo - Woodbury CT, US
Karl Boggs - Hopewell Junction NY, US

Assignee:

Advanced Technology Materials, Inc. - Danbury CT

International Classification:

C09K 13/00
C09K 13/04
C09K 13/06
H01L 21/302

US Classification:

252 791, 252 792, 252 794, 438692

Abstract:

A CMP composition containing 5-aminotetrazole, e. g. , in combination with oxidizing agent, chelating agent, abrasive and solvent. Such CMP composition advantageously is devoid of BTA, and is useful for polishing surfaces of copper elements on semiconductor substrates, without the occurrence of dishing or other adverse planarization deficiencies in the polished copper, even in the presence of substantial levels of copper ions, e. g. , Cu, in the bulk CMP composition at the copper/CMP composition interface during CMP processing.

US Patent:

8236695, Aug 7, 2012

Filed:

Sep 19, 2008

Appl. No.:

12/234199

Inventors:

Jun Liu - Brookfield CT, US
Mackenzie King - Southbury CT, US
Michael S. Darsillo - Landenberg PA, US
Karl E. Boggs - Hopewell Junction NY, US
Jeffrey F. Roeder - Brookfield CT, US
Peter Wrschka - Phoenix AZ, US
Thomas H. Baum - New Fairfield CT, US

Assignee:

Advanced Technology Materials, Inc. - Danbury CT

International Classification:

H01L 21/302
B44C 1/22

US Classification:

438693, 438691, 438692, 216 88, 216 89

Abstract:

A method of passivating a CMP composition by dilution and determining the relationship between the extent of dilution and the static etch rate of copper. Such relationship may be used to control the CMP composition during the CMP polish to minimize the occurrence of dishing or other adverse planarization deficiencies in the polished copper, even in the presence of substantial levels of copper ions in the CMP composition and at the copper/CMP composition interface.

US Patent:

8637405, Jan 28, 2014

Filed:

Jun 21, 2011

Appl. No.:

13/165339

Inventors:

Mahadevaiyer Krishnan - Hopewell Junction NY, US
Jun Liu - Irvington NY, US
Satyavolu S. Papa Rao - Poughkeepsie NY, US
George G. Totir - Newtown CT, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01L 31/18
C09K 13/02

US Classification:

438693, 438 71, 438692, 977773, 257E3113

Abstract:

A method of texturing a surface of a crystalline silicon substrate is provided. The method includes immersing a crystalline silicon substrate into an aqueous alkaline etchant solution to form a pyramid shaped textured surface, with (111) faces exposed, on the crystalline silicon substrate. The aqueous alkaline etchant solution employed in the method of the present disclosure includes an alkaline component and a nanoparticle slurry component. Specifically, the aqueous alkaline etchant solution of the present disclosure includes 0. 5 weight percent to 5 weight percent of an alkaline component and from 0. 1 weight percent to 5 weight percent of a nanoparticle slurry on a dry basis.

US Patent:

7361603, Apr 22, 2008

Filed:

Apr 28, 2005

Appl. No.:

11/117274

Inventors:

Jun Liu - Brookfield CT, US
Mackenzie King - Southbury CT, US
Michael Darsillo - Woodbury CT, US
Karl E. Boggs - Hopewell Junction NY, US
Jeffrey F. Roeder - Brookfield CT, US
Thomas H. Baum - New Fairfield CT, US

Assignee:

Advanced Technology Materials, Inc. - Danbury CT

International Classification:

H01L 21/302
H01L 21/461

US Classification:

438693, 438692, 257E21304

Abstract:

A CMP composition containing 5-aminotetrazole, e. g. , in combination with oxidizing agent, chelating agent, abrasive and solvent and a method of use. Such CMP composition may be diluted during the CMP polish to minimize the occurrence of dishing or other adverse planarization deficiencies in the polished copper, even in the presence of substantial levels of copper ions in the CMP composition and at the copper/CMP composition interface during CMP processing.