Kang C Luo

US Patent:

20100104747, Apr 29, 2010

Filed:

Oct 15, 2009

Appl. No.:

12/579569

Inventors:

Van Nguyen Truskett - Austin TX, US
Philip D. Schumaker - Austin TX, US
Jared L. Hodge - Austin TX, US
Kang Luo - Austin TX, US
Bharath Thiruvengadachari - Round Rock TX, US

Assignee:

Molecular Imprints, Inc. - Austin TX

International Classification:

B05D 7/22

US Classification:

427230

Abstract:

A dispense controller and a tool controller may aid in providing a drop pattern of fluid on a substrate. The dispense controller may provide dispense coordinates to a fluid dispense system based on the drop pattern. The tool controller may control movement of a stage and also provide synchronization pulses to the fluid dispense system. The fluid dispense system may provide the drop pattern of fluid on the substrate using the dispense coordinates and the synchronization pulses.

US Patent:

20220363060, Nov 17, 2022

Filed:

Jan 12, 2022

Appl. No.:

17/647780

Inventors:

- Santa Clara CA, US
Kang LUO - Santa Clara CA, US
Kazuya DAITO - Milpitas CA, US
Kenneth S. LEDFORD - San Jose CA, US
Elsa MASSONNEAU - Sunnyvale CA, US
Alexey STEPANOV - Sunnyvale CA, US
Ludovic GODET - Sunnyvale CA, US
Mahendran CHIDAMBARAM - Saratoga CA, US
Visweswaren SIVARAMAKRISHNAN - Cupertino CA, US
Bahubali S. UPADHYE - Bangalore, IN
Hemantha RAJU - Bangalore, IN

International Classification:

B41J 2/165

Abstract:

Embodiments described herein relate to an inkjet service station and methods of servicing an inkjet printer with the inkjet service station. The inkjet service station is disposed in an inkjet printer of an inkjet chamber. The inkjet service station is operable to perform servicing operations on a processing apparatus of the inkjet printer. The servicing operations include at least one of printhead spitting, printhead purging, printhead flushing, printhead cleaning, printhead drying, or vacuum suction.

US Patent:

20220363064, Nov 17, 2022

Filed:

Jan 12, 2022

Appl. No.:

17/647820

Inventors:

- Santa Clara CA, US
Ludovic Godet - Sunnyvale CA, US
Michael David-Scott Kemp - San Jose CA, US
Kang Luo - Santa Clara CA, US
Kazuya Daito - Milpitas CA, US
Kenneth S. Ledford - San Jose CA, US
Bahubali S. Upadhye - Bangalore, IN
Hemantha Raju - Bangalore, IN
John Rusconi - Dublin CA, US
Elsa Massonneau - Sunnyvale CA, US
Mahendran Chidambaram - Saratoga CA, US
Alexey Stepanov - Sunnyvale CA, US
Visweswaren Sivaramakrishnan - Cupertino CA, US

International Classification:

B41J 2/175

Abstract:

Embodiments described herein relate to an inkjet printing platform. The inkjet printing platform is utilized for fabrication of optical films and optical device structures. The inkjet printing platform includes a transfer chamber, one or more inkjet chambers, a plurality of auxiliary modules, a substrate flipper, and load ports. The inkjet printing platform is operable to perform an inkjet printing process on a substrate to form an optical film and/or an optical device.

US Patent:

20220365262, Nov 17, 2022

Filed:

Jul 19, 2022

Appl. No.:

17/868485

Inventors:

- Plantation FL, US
Kang Luo - Austin TX, US
Vikramjit Singh - Pflugerville TX, US
Frank Y. Xu - Austin TX, US

International Classification:

G02B 5/18
G02B 27/01

Abstract:

A method of fabricating a blazed diffraction grating comprises providing a master template substrate and imprinting periodically repeating lines on the master template substrate in a plurality of master template regions. The periodically repeating lines in different ones of the master template regions extend in different directions. The method additionally comprises using at least one of the master template regions as a master template to imprint at least one blazed diffraction grating pattern on a grating substrate.

US Patent:

20220355589, Nov 10, 2022

Filed:

Jan 12, 2022

Appl. No.:

17/647791

Inventors:

- Santa Clara CA, US
Kazuya DAITO - Milpitas CA, US
Kang LUO - Santa Clara CA, US
Elsa MASSONNEAU - Sunnyvale CA, US
Alexey STEPANOV - Sunnyvale CA, US
Ludovic GODET - Sunnyvale CA, US

International Classification:

B41J 2/165

Abstract:

Embodiments described herein provide for a fluid management system and a method of utilizing the fluid management system. The fluid management system includes a servicing fluid management system and an ink management system. The servicing fluid management system and the ink management system run in parallel within an inkjet chamber. The ink management system supports the flow of inkjet materials between a waste tank, one or more inkjet material supply tanks, an ink management module, and the inkjet printer. The servicing fluid management system supports the flow of servicing fluids between the waste tank, one or more servicing fluid supply tanks, a servicing fluid management module, and the inkjet printer.

US Patent:

20220357656, Nov 10, 2022

Filed:

May 9, 2022

Appl. No.:

17/740116

Inventors:

- Santa Clara CA, US
Kang LUO - Santa Clara CA, US
Erica CHEN - Cupertino CA, US
Yongan XU - Santa Clara CA, US

International Classification:

G03F 7/00
G02B 5/18

Abstract:

A method of imprinting a pattern on a substrate is provided. The method includes forming a first pattern on a plurality of masters using a method other than imprinting, the first pattern including a plurality of patterned features of varying sizes; measuring the patterned features at a plurality of locations on each of the masters; selecting a first master of the plurality of masters based on the measurements of the patterned features on each of the masters; using the first master to form a second pattern on an imprint template; and imprinting the first pattern on a first device with the imprint template.

US Patent:

20220307127, Sep 29, 2022

Filed:

Mar 22, 2022

Appl. No.:

17/655849

Inventors:

- Santa Clara CA, US
Jinxin FU - Fremont CA, US
Kang LUO - Santa Clara CA, US
Ludovic GODET - Sunnyvale CA, US

International Classification:

C23C 14/48
C23C 14/02
C23C 14/58
C23C 14/00
C03C 23/00

Abstract:

Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a diffusion material in the discrete area, and removing excess diffusion material to form an optical material in the optical device substrate or the optical device layer having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.

US Patent:

20220299677, Sep 22, 2022

Filed:

Mar 15, 2022

Appl. No.:

17/654860

Inventors:

- Santa Clara CA, US
Kang Luo - Santa Clara CA, US
Hao Tang - San Jose CA, US
Jinrui Guo - San Jose CA, US
Ludovic Godet - Sunnyvale CA, US

International Classification:

G02B 1/00
G02B 1/11
G02B 5/18

Abstract:

Embodiments of the present disclosure generally relate to encapsulated optical devices and methods of forming encapsulated optical devices. The optical devices include a plurality of optical device structures disposed on a substrate. An encapsulation coating is disposed over the plurality of optical device structures. The encapsulation coating includes a ratio of encapsulation material to solvent. A plurality of gaps are formed in the optical device. The plurality of gaps are formed when the solvent is evaporated from the encapsulation coating. The material composition of the encapsulation coating, the width and device angle of the plurality of optical device structures, as well as process parameters of the spin on coating process, the curing process, the baking process, the drying process, and the developing process will affect the formation of the plurality of gaps and the depth at which the plurality of gaps are formed.