Ken C Gross

US Patent:

20230039104, Feb 9, 2023

Filed:

Aug 5, 2022

Appl. No.:

17/817942

Inventors:

- Camas WA, US
Ken Gross - Vancouver WA, US

Assignee:

nLIGHT, Inc. - Camas WA

International Classification:

H01L 31/18
G21K 5/04
H05K 3/02
G06F 3/044
G06F 3/041

Abstract:

Disclosed herein are laser scanning systems and methods of their use. In some embodiments, laser scanning systems can be used to ablatively or non-ablatively scan a surface of a material. Some embodiments include methods of scanning a multi-layer structure. Some embodiments include translating a focus-adjust optical system so as to vary laser beam diameter. Some embodiments make use of a 20-bit laser scanning system.

US Patent:

20200292765, Sep 17, 2020

Filed:

Mar 12, 2020

Appl. No.:

16/817357

Inventors:

- Vancouver WA, US
Ken Gross - Vancouver WA, US

Assignee:

NLIGHT, INC. - Vancouver WA

International Classification:

G02B 6/42
G02B 26/10

Abstract:

Some embodiments may include a method of generating assessment data in a system including a galvanometric scanning system (GSS) having a laser device to generate a laser beam and an X-Y scan head module to position the laser beam on a work piece. The method may include selecting a dimension based on a desired accuracy for validation (and/or a characteristic of an imaging system in embodiments that utilize an imaging system). The method may include commanding the GSS to draw a mark based on a polygon or ellipse of the selected dimension around a predetermined target point associated with the work piece to generate assessment data, and following operation of the GSS based on said commanding, validating a calibration of the GSS using the assessment data (or an image thereof in embodiments that utilize an imaging system). Other embodiments may be disclosed and/or claimed.

US Patent:

20200292806, Sep 17, 2020

Filed:

Mar 12, 2020

Appl. No.:

16/817450

Inventors:

- Vancouver WA, US
Ken Gross - Vancouver WA, US

Assignee:

NLIGHT, INC. - Vancouver WA

International Classification:

G02B 26/10

Abstract:

Some embodiments may include a method assessing whether a dynamic focus module in a three axis galvanometric scanning system (three-axis GSS) is associated with a focus calibration error. The method may include identifying a reference layer associated with a surface of the work piece and positive and negative offset distances each a difference distance above or below the reference layer, respectively, and selecting a target pattern based on the offset distances, wherein the pattern includes an individual line for each offset distance. The method may include commanding the three-axis GSS to draw the target pattern on the work piece, and then assessing whether the dynamic focus module is associated with the focus calibration error by correlating laser marking artifacts on the work piece to ones of the individual lines of the selected pattern. Other embodiments may be disclosed and/or claimed.

US Patent:

20200251237, Aug 6, 2020

Filed:

Feb 10, 2020

Appl. No.:

16/786957

Inventors:

- Vancouver WA, US
Ken Gross - Vancouver WA, US

Assignee:

nLIGHT, Inc. - Vancouver WA

International Classification:

G21K 5/04
H05K 3/02
H01L 31/18
G06F 3/044
G06F 3/041

Abstract:

Disclosed herein are laser scanning systems and methods of their use. In some embodiments, laser scanning systems can be used to ablatively or non-ablatively scan a surface of a material. Some embodiments include methods of scanning a multi-layer structure. Some embodiments include translating a focus-adjust optical system so as to vary laser beam diameter. Some embodiments make use of a 20-bit laser scanning system.

US Patent:

20200043736, Feb 6, 2020

Filed:

Oct 10, 2019

Appl. No.:

16/598210

Inventors:

- Vancouver WA, US
Scott R. Karlsen - Battle Ground WA, US
Ken Gross - Vancouver WA, US

Assignee:

nLIGHT, Inc. - Vancouver WA

International Classification:

H01L 21/268
H01L 21/02
B23K 26/00
B23K 26/0622

Abstract:

Laser pulses from pulsed fiber lasers are directed to an amorphous silicon layer to produce a polysilicon layer comprising a disordered arrangement of crystalline regions by repeated melting and recrystallization. Laser pulse durations of about 0.5 to 5 ns at wavelength range between about 500 nm and 1000 nm, at repetition rates of 10 kHz to 10 MHz can be used. Line beam intensity uniformity can be improved by spectrally broadening the laser pulses by Raman scattering in a multimode fiber or by applying varying phase delays to different portions of a beam formed with the laser pulses to reduce beam coherence.

US Patent:

20190250398, Aug 15, 2019

Filed:

Apr 18, 2019

Appl. No.:

16/388613

Inventors:

- Vancouver WA, US
Ken Gross - Vancouver WA, US
Vito P. Errico - Vancouver WA, US

Assignee:

nLIGHT, Inc. - Vancouver WA

International Classification:

G02B 26/10
G01B 11/00

Abstract:

A method includes determining a set of pattern position errors between (i) a set of expected pattern positions of a calibration pattern on a laser target situated in a laser processing field of a laser system and produced based on a set of initial scan optic actuation corrections associated with a scan optic of the laser system and (ii) a set of measured pattern positions of the calibration pattern, determining a set of scan optic actuation rates based on the set of initial scan optic actuation corrections, and updating the set of initial scan optic actuation corrections based on the set of scan optic actuation rates and the set of pattern position errors so as to form a set of updated scan optic actuation corrections that is associated with a reduction of at least a portion of the set of pattern position errors.

US Patent:

20180284490, Oct 4, 2018

Filed:

Mar 23, 2018

Appl. No.:

15/934714

Inventors:

- Vancouver WA, US
Ken GROSS - Vancouver WA, US
Dahv A.V. KLINER - Portland OR, US
Roger FARROW - Vancouver WA, US

Assignee:

nLIGHT, Inc. - Vancouver WA

International Classification:

G02F 1/01
B23K 26/06
G02B 6/42
G02B 6/255
G02B 6/26
G02B 6/036
G02B 6/028
G02B 27/09
B23K 26/21
B23K 26/073
B23K 26/38

Abstract:

A method of tailoring beam characteristics of a laser beam during fabrication of an electronic device. The method includes: providing a substrate comprising one or more layers; adjusting one or more characteristics of a laser beam; and impinging the laser beam having the adjusted beam characteristics on the substrate to carry out at least one process step for fabricating the electronic device. The adjusting of the laser beam comprises: perturbing the laser beam propagating within a first length of fiber to adjust the one or more beam characteristics of the laser beam in the first length of fiber or a second length of fiber or a combination thereof, the second length of fiber having two or more confinement regions; coupling the perturbed laser beam into the second length of fiber; and emitting the laser beam having the adjusted beam characteristics from the second length of fiber.

US Patent:

20180214985, Aug 2, 2018

Filed:

Mar 22, 2018

Appl. No.:

15/933160

Inventors:

- Vancouver WA, US
Ken Gross - Vancouver WA, US
Aaron W. Brown - Vancouver WA, US
Dahv A.V. Kliner - Portland OR, US

International Classification:

B23K 26/342
B33Y 30/00
B22F 3/105
B28B 1/00
B29C 64/141
B29C 64/268
B29C 64/371
B33Y 40/00
G02B 27/09
G02B 6/26
B23K 26/12
B23K 26/04
B23K 26/06

Abstract:

Disclosed herein are methods, apparatus, and systems for a multi-operation optical beam delivery device having a laser source to generate the optical beam. A beam characteristic conditioner that, in response to a control input indicating a change between the different laser process operations, controllably modifies the beam characteristics for a corresponding laser process operation of the different laser process operations. A delivery fiber has an input end coupled to the beam characteristic conditioner and an output end coupled to a process head for performing the corresponding laser process operation.