Lin Xu

US Patent:

7739267, Jun 15, 2010

Filed:

Mar 10, 2006

Appl. No.:

11/373084

Inventors:

Qi Jin - San Jose CA, US
Dinkar Venkatraman Rao - San Jose CA, US
Sriram Srinivasan - Sunnyvale CA, US
Lin Xu - San Jose CA, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G06F 7/00

US Classification:

707718, 707714, 707764

Abstract:

A computer implemented method for processing a mixed data flow. Mixed data flow operators are classified. The mixed data flow operators are associated with multiple runtime environments in which the mixed data flow operators can be executed. The mixed data flow operators are segregated into regions. A mixed data flow operator in a particular region is executable by one of the multiple runtime environments associated with the particular region. The execution of the regions is sequenced.

US Patent:

7744720, Jun 29, 2010

Filed:

Dec 6, 2007

Appl. No.:

11/951861

Inventors:

Lee Chen - Cedar Creek TX, US
Lin Xu - Houston TX, US

Assignee:

Tokyo Electron Limited - Tokyo

International Classification:

H01L 21/3065
C23C 16/455
C23C 16/505
B21K 21/08

US Classification:

15634534, 15634533, 118715, 118723, 29890142

Abstract:

A chamber component configured to be coupled to a process chamber and a method of fabricating the chamber component is described. The chamber component comprises a chamber element comprising a first surface on a supply side of the chamber element and a second surface on a process side of the chamber element, wherein the chamber element comprises a reentrant cavity formed in the first surface and a conduit having an inlet coupled to the reentrant cavity and an outlet coupled to the second surface. Furthermore, the chamber component comprises an insertable member configured to couple with the reentrant cavity, the insertable member having one or more passages formed there through and each of the one or more passages are aligned off-axis from the conduit, wherein the one or more passages are configured to receive a process fluid on the supply side and the conduit is configured to distribute the process fluid from the one or more passages on the process side.

US Patent:

7774300, Aug 10, 2010

Filed:

Dec 9, 2005

Appl. No.:

11/299085

Inventors:

Hui-I Hsiao - Saratoga CA, US
Joshua Wai-ho Hui - San Jose CA, US
Madhumati Krishnan - San Jose CA, US
Lin Xu - San Jose CA, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G09F 7/00

US Classification:

707602

Abstract:

A system and method for data model and content migration in content management applications is disclosed that facilitates data migration by utilizing a markup-language format to preserve dependency and enable compatibility among various platforms, applications, devices, etc. The method generally includes retrieving a plurality of objects, determining a dependency of the plurality of objects, extracting object definitions from the objects, forming a markup-language user document with the extracted object definitions utilizing the determined object dependency, and exporting the markup-language user document.

US Patent:

7777179, Aug 17, 2010

Filed:

Mar 31, 2008

Appl. No.:

12/059983

Inventors:

Lee Chen - Cedar Creek TX, US
Lin Xu - Houston TX, US
Ronald Victor Bravenec - Austin TX, US

Assignee:

Tokyo Electron Limited - Tokyo

International Classification:

H01J 37/04
H01J 49/00
H01J 3/26

US Classification:

250281, 250282, 250397, 324466

Abstract:

An ion energy analyzer is described for use in diagnosing the ion energy distribution (IED) of ions incident on a radio frequency (RF) biased substrate immersed in plasma. The ion energy analyzer comprises an entrance grid exposed to the plasma, an electron rejection grid disposed proximate to the entrance grid, and an ion current collector disposed proximate to the electron rejection grid. The ion current collector is coupled to an ion selection voltage source configured to positively bias the ion current collector by an ion selection voltage, and the electron rejection grid is coupled to an electron rejection voltage source configured to negatively bias the electron rejection grid by an electron rejection voltage. Furthermore, an ion current meter is coupled to the ion current collector to measure the ion current.

US Patent:

7875859, Jan 25, 2011

Filed:

Mar 31, 2008

Appl. No.:

12/059855

Inventors:

Lee Chen - Cedar Creek TX, US
Lin Xu - Houston TX, US
Ronald Victor Bravenec - Austin TX, US

Assignee:

Tokyo Electron Limited - Tokyo

International Classification:

G01K 1/08

US Classification:

250397, 250396 R

Abstract:

An ion energy analyzer is described for use in diagnosing the ion energy distribution (IED) of ions incident on a radio frequency (RF) biased substrate immersed in plasma. The ion energy analyzer comprises an entrance grid exposed to the plasma, an ion selection grid disposed proximate to the entrance grid, an electron rejection grid disposed proximate to the ion selection grid, and an ion current collector disposed proximate to the electron rejection grid. The ion selection grid is coupled to an ion selection voltage source configured to positively bias the ion selection grid by an ion selection voltage, and the electron rejection grid is coupled to an electron rejection voltage source configured to negatively bias the electron rejection grid by an electron rejection voltage. Furthermore, an ion current meter is coupled to the ion current collector to measure the ion current.

US Patent:

7883839, Feb 8, 2011

Filed:

Dec 4, 2006

Appl. No.:

11/633233

Inventors:

Vincent M Donnelly - Houston TX, US
Demetre J. Economou - Houston TX, US
Paul Ruchhoeft - Houston TX, US
Lin Xu - Houston TX, US
Sri Charan Vemula - Leuven, BE
Manish Kumar Jain - Houston TX, US

Assignee:

University of Houston - Houston TX

International Classification:

G21K 1/08
C03C 25/60

US Classification:

430323, 250396 R, 25049221, 250309, 25049222, 216 66, 216 67

Abstract:

A method is provided for creating a plurality of substantially uniform nano-scale features in a substantially parallel manner in which an array of micro-lenses is positioned on a surface of a substrate, where each micro-lens includes a hole such that the bottom of the hole corresponds to a portion of the surface of the substrate. A flux of charged particles, e. g. , a beam of positive ions of a selected element, is applied to the micro-lens array. The flux of charged particles is focused at selected focal points on the substrate surface at the bottoms of the holes of the micro-lens array. The substrate is tilted at one or more selected angles to displace the locations of the focal points across the substrate surface. By depositing material or etching the surface of the substrate, several substantially uniform nanometer sized features may be rapidly created in each hole on the surface of the substrate in a substantially parallel manner.

US Patent:

8030620, Oct 4, 2011

Filed:

May 5, 2009

Appl. No.:

12/435545

Inventors:

Vincent M. Donnelly - Houston TX, US
Demetre J. Economou - Houston TX, US
Paul Ruchhoeft - Houston TX, US
Lin Xu - Houston TX, US
Sri Charan Vemula - Leuven, BE
Manish Kumar Jain - Houston TX, US

Assignee:

University of Houston - Houston TX

International Classification:

H01J 3/26
G21K 1/08

US Classification:

250396R, 25049221, 250309, 25049222, 216 66, 216 67, 430323, 118640

Abstract:

A method is provided for creating a plurality of substantially uniform nano-scale features in a substantially parallel manner in which an array of micro-lenses is positioned on a surface of a substrate, where each micro-lens includes a hole such that the bottom of the hole corresponds to a portion of the surface of the substrate. A flux of charged particles, e. g. , a beam of positive ions of a selected element, is applied to the micro-lens array. The flux of charged particles is focused at selected focal points on the substrate surface at the bottoms of the holes of the micro-lens array. The substrate is tilted at one or more selected angles to displace the locations of the focal points across the substrate surface. By depositing material or etching the surface of the substrate, several substantially uniform nanometer sized features may be rapidly created in each hole on the surface of the substrate in a substantially parallel manner.

US Patent:

8099725, Jan 17, 2012

Filed:

Oct 11, 2006

Appl. No.:

11/548659

Inventors:

Qi Jin - San Jose CA, US
Hui Liao - Santa Clara CA, US
Lin Xu - San Jose CA, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G06F 9/44
G06F 9/45

US Classification:

717151, 717106, 717153, 717154, 717159

Abstract:

Methods, computer program products, and system for generating code for an extract, transform, and load (ETL) data flow are provided. In one implementation, the method includes receiving an ETL data flow representing a logical transformation and flow of data, placing a staging table at a pre-determined location in the ETL data flow to reduce a total number of staging tables required by the transformation, and generating code for the transformation based on the ETL data flow including the staging table placed at the pre-determined location.