Mark Y Liu

age ~59

from West Linn, OR

Also known as:
  • Mark Yue Liu
  • Mark V Liu
  • Mark H Liu
  • Yue Liu
  • Mark Y Yiu
  • Mark Y Lin

Mark Liu Phones & Addresses

  • West Linn, OR
  • Las Vegas, NV
  • Vancouver, WA
  • Portland, OR
  • Clackamas, OR
  • Saint Paul, MN
  • Hillsboro, OR

Amazon

Dos & Don'ts In Hong Kong

Dos & Don'ts in Hong Kong

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Hong Kong natives are fascinating -- they talk constantly, use extravagant hand gestures and love to eat a cuisine that may be the best in the world. Behind the high rise living, Armani suits, financial acumen and sophisticated nightlife, the traditions of the Cantonese grandma and corner shop herba...


Author
Colin Storey, Mary Leong

Binding
Kindle Edition

Pages
224

Publisher
iGroup Publishing

ISBN #
1

Us Patents

  • Extension Of Shallow Trench Isolation By Ion Implantation

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  • US Patent:
    6432798, Aug 13, 2002
  • Filed:
    Aug 10, 2000
  • Appl. No.:
    09/636297
  • Inventors:
    Mark Y. Liu - Portland OR
    Leonard C. Pipes - Beaverton OR
    Mitchell C. Taylor - Lake Oswego OR
  • Assignee:
    Intel Corporation - Santa Clara CA
  • International Classification:
    H01L 2176
  • US Classification:
    438433, 438296, 438424, 438440
  • Abstract:
    A shallow trench isolation (STI) structure is formed by etching trenches into the surface of a substrate in alignment with a patterned masking layer. An ion implantation of, for example, carbon, nitrogen, or oxygen, is performed so as to create an electrically insulating layer extending downwardly from a bottom surface of the trench. By implanting such extensions, STI structures with greater effective aspect ratios may be obtained which, in turn, allow greater packing density in integrated circuits. Implanted isolation structures may be formed without etching a trench by implanting into regions of the substrate. In this way, trench etch, dielectric back-fill, and planarization operations can be eliminated. Furthermore the implanted regions may be formed by multiple implants at different energies so as to obtain multiple, typically contiguous, target ranges. Ions of various masses or charges may be used so as to obtain the desired implant depth and concentration profile in the isolation structures, independent of whether these structures are trench extensions or formed directly beneath a planarized substrate surface.
  • Extension Of Shallow Trench Isolation By Ion Implantation

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  • US Patent:
    6590271, Jul 8, 2003
  • Filed:
    Aug 24, 2001
  • Appl. No.:
    09/939337
  • Inventors:
    Mark Y. Liu - Portland OR
    Leonard C. Pipes - Beaverton OR
    Mitchell C. Taylor - Lake Oswego OR
  • Assignee:
    Intel Corporation - Santa Clara CA
  • International Classification:
    H01L 2176
  • US Classification:
    257510
  • Abstract:
    A shallow trench isolation (STI) structure is formed by etching trenches into the surface of a substrate in alignment with a patterned masking layer. An ion implantation of, for example, carbon, nitrogen, or oxygen, is performed so as to create an electrically insulating layer extending downwardly from a bottom surface of the trench. By implanting such extensions, STI structures with greater effective aspect ratios may be obtained which, in turn, allow greater packing density in integrated circuits. Implanted isolation structures may be formed without etching a trench by implanting into regions of the substrate. In this way, trench etch, dielectric back-fill, and planarization operations can be eliminated. Furthermore the implanted regions may be formed by multiple implants at different energies so as to obtain multiple, typically contiguous, target ranges. Ions of various masses or charges may be used so as to obtain the desired implant depth and concentration profile in the isolation structures, independent of whether these structures are trench extensions or formed directly beneath a planarized substrate surface.
  • Integrated Circuit Annealing Methods And Apparatus

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  • US Patent:
    6675057, Jan 6, 2004
  • Filed:
    Apr 25, 2001
  • Appl. No.:
    09/842389
  • Inventors:
    Mark Y. Liu - Portland OR
  • Assignee:
    Intel Corporation - Santa Clara CA
  • International Classification:
    G06F 1900
  • US Classification:
    700117, 700108, 2191216, 21912185
  • Abstract:
    Improved methods for performing thermal annealing of objects, such as wafers of integrated circuits (ICs), employ a scanning continuous wave laser beam. The annealing time is dependent upon the beam intensity, the beam spot size, the beam shape, and the beam dwell time, which can be effectively controlled by varying the scanning speed. A variety of different scan patterns can be used. Because the entire wafer is thermally processed by a continuously moving laser beam, annealing throughput is significantly improved over methods utilizing a stepping laser beam.
  • Sacrificial Annealing Layer For A Semiconductor Device And A Method Of Fabrication

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  • US Patent:
    6909154, Jun 21, 2005
  • Filed:
    Nov 17, 2003
  • Appl. No.:
    10/716321
  • Inventors:
    Mark Y. Liu - Portland OR, US
    Justin K. Brask - Portland OR, US
  • Assignee:
    Intel Corporation - Santa Clara CA
  • International Classification:
    H01L029/76
    H01L023/48
    H01L031/113
  • US Classification:
    257407, 257408, 257757
  • Abstract:
    Numerous embodiments of a method and apparatus for a sacrificial annealing layer are disclosed. In one embodiment, a method of forming a sacrificial annealing layer for a semiconductor device comprises forming one or more sacrificial layers on at least a portion of the top surface of a semiconductor device, annealing at least a portion of the device, and removing a substantial portion of the one or more sacrificial layers, where the removing results in no substantial physical alterations to the device.
  • Creating Shallow Junction Transistors

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  • US Patent:
    6936518, Aug 30, 2005
  • Filed:
    Jan 21, 2004
  • Appl. No.:
    10/761550
  • Inventors:
    Jack Hwang - Portland OR, US
    Mitchell C. Taylor - Lake Oswego OR, US
    Mark Y. Liu - Portland OR, US
    Nick Lindert - Beaverton OR, US
  • Assignee:
    Intel Corporation - Santa Clara CA
  • International Classification:
    H01L021/336
  • US Classification:
    438299, 438197, 438293
  • Abstract:
    A polysilicon structure may be defined on a semiconductor substrate using plasma doping to dope the sidewalls and upper surface of the polysilicon material as well as the source drain extensions. Shortly after plasma doping, the structure may be encapsulated within a suitable capping layer to prevent the removal of the thin surface doped regions during subsequent semiconductor processing.
  • Apparatus And Method For Adiabatically Heating A Semiconductor Surface

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  • US Patent:
    6952269, Oct 4, 2005
  • Filed:
    Sep 24, 2002
  • Appl. No.:
    10/253762
  • Inventors:
    Jose A. Maiz - Portland OR, US
    Sarangapani Sista - Hillsboro OR, US
    Mark Liu - Portland OR, US
  • Assignee:
    Intel Corporation - Santa Clara CA
  • International Classification:
    G01B009/02
  • US Classification:
    356479, 438682
  • Abstract:
    A method for adiabatically heating semiconductor device surfaces, including using capping layers to prevent deformation of surfaces. Using the method, semiconductor surfaces having varying topographies or topologies may be heated adiabatically. In an embodiment of the method, one or more capping layers may be formed over a semiconductor surface, to further prevent deformation of semiconductor surfaces.
  • Arrangements Incorporating Laser-Induced Cleaving

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  • US Patent:
    7052978, May 30, 2006
  • Filed:
    Aug 28, 2003
  • Appl. No.:
    10/649958
  • Inventors:
    Mohamad A. Shaheen - Portland OR, US
    Mark Y. Liu - Portland OR, US
    Mitchell C. Taylor - Lake Oswego OR, US
  • Assignee:
    Intel Corporation - Santa Clara CA
  • International Classification:
    H01L 21/301
  • US Classification:
    438463, 438458, 438460
  • Abstract:
    Arrangements incorporating laser-induced cleaving.
  • Sacrificial Annealing Layer For A Semiconductor Device And A Method Of Fabrication

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  • US Patent:
    7115479, Oct 3, 2006
  • Filed:
    Nov 26, 2002
  • Appl. No.:
    10/305684
  • Inventors:
    Mark Y. Liu - Portland OR, US
    Justin K. Brask - Portland OR, US
  • Assignee:
    Intel Corporation - Santa Clara CA
  • International Classification:
    H01L 21/76
    H01L 21/3205
    H01L 21/44
    H01L 21/302
  • US Classification:
    438437, 438591, 438624, 438663
  • Abstract:
    Numerous embodiments of a method and apparatus for a sacrificial annealing layer are disclosed. In one embodiment, a method of forming a sacrificial annealing layer for a semiconductor device comprises forming one or more sacrificial layers on at least a portion of the top surface of a semiconductor device, annealing at least a portion of the device, and removing a substantial portion of the one or more sacrificial layers, where the removing results in no substantial physical alterations to the device.

Medicine Doctors

Mark Liu Photo 1

Mark Liu

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Name / Title
Company / Classification
Phones & Addresses
Mark Liu
President
Las Vegas Global Travel, Inc
3301 Spg Mtn Rd, Las Vegas, NV 89102
Mark Liu
M
Asi Design International, LLC
723 S Casino Ctr Blvd, Las Vegas, NV 89101

Lawyers & Attorneys

Mark Liu Photo 2

Mark Liu - Lawyer

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Office:
DLA Piper Hong Kong
Specialties:
Corporate
ISLN:
922191527
Mark Liu Photo 3

Mark Liu - Lawyer

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Office:
Akerman LLP
Specialties:
Capital Markets
Corporate
Corporate Governance
EB-5 Immigrant Investor Program
Emerging Growth Companies
International
M&A and Private Equity
Cannabis
Financial Services
Mergers & Acquisitions
Real Estate and Construction
Securities & Investment Fraud
ISLN:
918650403
Admitted:
2006
University:
Washington University, B.S., 2000
Law School:
University of Iowa College of Law, J.D., 2005

Plaxo

Mark Liu Photo 4

Mark Liu

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Owner at ASI Asiatic Co., Ltd. Past: CEO at ASI Asiatic Co., Ltd., Managing Director at ASI Asiatic Co., Ltd., Vice President...
Mark Liu Photo 5

Mark Y. Liu (劉彥廷)

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Proxim Wireless
Mark Liu Photo 6

Mark Liu www.ssw.com.au

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SSW
Mark Liu Photo 7

Mark Liu

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Shanghai
Mark Liu Photo 8

Mark Liu

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CBS News
Mark Liu Photo 9

mark liu

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Accenture

Classmates

Mark Liu Photo 10

Mark Liu

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Schools:
Edward M. Funk Public School 33 Queens Village NY 1994-1998
Community:
Eva Mayer, Dorothy Commander, Donald Baumgarten
Mark Liu Photo 11

Mark Liu (Ramirez)

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Schools:
Lake Braddock Middle School Fairfax VA 1991-1992
Community:
Rick Garcia
Mark Liu Photo 12

Mark Liu

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Schools:
St. Joseph's Boys School Calicut India 1987-1991
Community:
Harilal Rajagopal, Anand K, Sabu Dca, Dileep Kumar, Shinod Karayil, Naveen Kumar
Mark Liu Photo 13

Mark Liu

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Schools:
Chelsea School Public School 33 New York NY 1994-1998
Community:
Marc Fisher, John Dornellas, Jasmin Torres, Donald Baumgarten
Mark Liu Photo 14

Mark Liu, NYU-New York Un...

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Mark Liu Photo 15

Mark Liu | Thurgood Marsh...

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Mark Liu Photo 16

Mark Liu | Illinois Insti...

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Mark Liu Photo 17

Sierra Academy of Aeronau...

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Graduates:
Ryan Creswell (2002-2002),
Judy Cuesta (1971-1972),
Dale Dunlap (1996-1998),
Mark Liu (2004-2005),
Nathan McKenty (2000-2002),
Michael Cirella (1989-1991)

Mylife

Mark Liu Photo 18

Mark Liu

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Tags:
Male, Age: 26
Locality:
New York, NY
Mark Liu Photo 19

mark liu

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Tags:
Male, Age: 32, President
Locality:
Diamond Bar, CA
Mark Liu Photo 20

Mark Liu

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Tags:
Male, Age: 63
Locality:
Marietta, GA
Mark Liu Photo 21

Mark Liu

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Tags:
Male, Age: 38
Locality:
New York, NY
Mark Liu Photo 22

Mark Liu

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Tags:
Male, Age: 59
Locality:
Broomfield, CO
Mark Liu Photo 23

mark liu

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Tags:
Male, Age: 54
Locality:
Marietta, GA
Mark Liu Photo 24

Mark Liu

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Tags:
Male, Age: 48
Locality:
Brooklyn, NY
Mark Liu Photo 25

mark liu

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Tags:
Male, Age: 39, Chief Executive Officer
Locality:
El Monte, CA

Facebook

Mark Liu Photo 26

Mark Anthony Liu

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Mark Liu Photo 27

Mark Neil Liu

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Mark Liu Photo 28

Mark Richard Liu

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Mark Liu Photo 29

Kwok Ming Mark Liu

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Mark Liu Photo 30

Mark Liu

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Mark Liu Photo 31

Mark Liu

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Mark Liu Photo 32

Mark Liu

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Friends:
Mark Mark, Cover Photo
Mark Liu Photo 33

Mark Liu

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Googleplus

Mark Liu Photo 34

Mark Liu

Work:
PayPal - SDE (2012)
Education:
Nanjing University of Aeronautics and Astronautics
About:
Geek,S1
Tagline:
Stay hungry, stay foolish
Mark Liu Photo 35

Mark Liu

Relationship:
Married
Mark Liu Photo 36

Mark Liu

Work:
CBS News - Assignment Editor (2003)
Education:
University of California, Los Angeles - Political Science
Tagline:
Ohai I'm Yoink
Mark Liu Photo 37

Mark Liu

Work:
Acronis
Education:
Bates College - Economics
Mark Liu Photo 38

Mark Liu

Education:
Chapman University - Television and Broadcast Journalism
Tagline:
An average boy decided to get out of bed today. Hilarity ensues.
Mark Liu Photo 39

Mark Liu

Work:
Force Optical
Mark Liu Photo 40

Mark Liu

Work:
Celestica - Sr Test Engineer
Mark Liu Photo 41

Mark Liu

About:
Www.led-light-panel.net
Tagline:
LED panel light LED light panel

Youtube

TSMC Chairman on Pelosi's Potential Visit to ...

Mark Liu, Chairman, TSMC (Taiwan Semiconductor Manufacturing Co.)

  • Duration:
    13m 22s

Unleashing the Future of Innovation - Present...

2021 ISSCC Plenary Session 1.1 Unleashing the Future of Innovation Mar...

  • Duration:
    27m 24s

Dr Mark Liu - Advancing fashion beyond the ca...

Far from frivolous, the fashion industry is a complex combination of m...

  • Duration:
    4m 49s

TSMC shareholders meeting centers on Huawei r...

TSCM Chairman Mark Liu emphasized that the company's shipments to Huaw...

  • Duration:
    1m 40s

TSMC Chairman Discusses Semiconductor Chip Pr...

Mark Liu, the Chairman of #TSMC, the biggest high-end semiconductor #c...

  • Duration:
    17m 33s

Closing Keynote: Mark Liu

Keynote: Dr. Mark Liu Dr. Mark Liu brings science and technology to tr...

  • Duration:
    1h 11m 43s

Myspace

Mark Liu Photo 42

mark liu

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Locality:
the ville, California
Gender:
Male
Birthday:
1939
Mark Liu Photo 43

Mark Liu

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Locality:
Jamaica, Jamaica
Gender:
Male
Birthday:
1950
Mark Liu Photo 44

Mark Liu

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Locality:
LOS ANGELES, CALIFORNIA
Gender:
Male
Birthday:
1934
Mark Liu Photo 45

Mark liu

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Locality:
Loveland, Ohio
Gender:
Male
Birthday:
1947
Mark Liu Photo 46

Mark Liu

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Gender:
Male
Birthday:
1950

News

Huawei Outpaces Rivals With Chip Sanctions Ploy

Huawei outpaces rivals with chip sanctions ploy

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  • Huawei was TSMCs second largest client, contributing 14% of its total revenues in 2019. At an annual general meeting last week, TSMC chairman Mark Liu also revealed that several other customers from the US would buy more from the chipmaker to fill the gap left by Huawei.
  • Date: Jun 16, 2020
  • Category: Technology
  • Source: Google
Tsmc Cuts Revenue Outlook For 2018

TSMC cuts revenue outlook for 2018

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  • Also at the investors conference, TSMC co-CEO Mark Liu replied to an analyst's question about a recent US ban on sales of US-made chip components to China-based ZTE by saying that the impact should be minimal since TSMC has a "very wide" customer portfolio. Nevertheless, the consequence of the issue
  • Date: Apr 20, 2018
  • Category: Business
  • Source: Google
Ignore The Crowd On Apple

Ignore The Crowd On Apple

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  • During October 2016, the company reported significant revenue growth. "This strong growth was driven by our major customers' new mobile product launch and a stronger-than-seasonal growth from our other customers," said TSMC's Chief-Executive, Mark Liu. Although Liu never specifically identified App
  • Date: Oct 31, 2016
  • Category: Business
  • Source: Google
Apple Inc Supplier Taiwan Semiconductor Warns Of Low Demand In Q2

Apple Inc Supplier Taiwan Semiconductor Warns of Low Demand in Q2

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  • This also means that the demand for the tech giants expensive phones will also experience a fall. CEO Mark Liu commented: The smartphone growth in this year [has come] mostly from the medium- and the low-end. According to him, the company sees that the demand for phones over $500 is falling, whi
  • Date: Apr 14, 2016
  • Category: Business
  • Source: Google
News & Analysis Tsmc Expects To Rise From Industry Falloff In 2H

News & Analysis TSMC Expects to Rise from Industry Falloff in 2H

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  • Due to the world macroeconomic uncertainties, we reduced our estimates of 2016 smartphone growth from 8% to 7%, said TSMC Co-CEO Mark Liu. He added that the company has cut forecasts for PC growth to negative 6% from an earlier negative 3% and tablets, to negative 9% from negative 7%. Nevertheless
  • Date: Apr 14, 2016
  • Category: Business
  • Source: Google
Tsmc Q2 Revenue Likely To Fall Short

TSMC Q2 revenue likely to fall short

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  • irst quarter. We see customers and even end-market demand increasing. [Customer] inventory restocking is still cautious, co-chief executive officer Mark Liu () told an investors conference, adding that the company would be closely monitoring the demand situation from month to month.
  • Date: Apr 14, 2016
  • Category: Business
  • Source: Google
Apple Supplier Taiwan Semiconductor: Demand For $500 Phones Dying

Apple Supplier Taiwan Semiconductor: Demand For $500 Phones Dying

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  • But on the brighter side, the chipmaker says it will reuse 95% of its chip-manufacturing tools as it transitions to 7-nanometer chips from 10-nm in 2017 through 2019. Growing 4G and 5G opportunities will drive the adoption, TSMs co-CEO Mark Liu told analysts on the conference call.
  • Date: Apr 14, 2016
  • Category: Business
  • Source: Google
Apple's Slowing Iphone Sales Take Bite Out Of Suppliers' Revenues

Apple's Slowing iPhone Sales Take Bite Out of Suppliers' Revenues

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  • We see a reduction in high-end smartphone demand, said Mark Liu, one ofTSMCs co-chief executives, at an investor conferenceon Thursday, without mentioning specific customers. He said China and other emerging markets, however, were showing signs of recovery and thatTSMCexpects to return to
  • Date: Jan 14, 2016
  • Category: Business
  • Source: Google

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