Matthew Phillip Graham

US Patent:

8295316, Oct 23, 2012

Filed:

Mar 24, 2010

Appl. No.:

12/730506

Inventors:

Robert P. Akins - Escondido CA, US
Richard L. Sandstrom - Encinitas CA, US
Daniel J. W. Brown - San Diego CA, US
Matthew R. Graham - San Diego CA, US
Kevin W. Zhang - San Diego CA, US
Patrick L. Nelissen - Ramona CA, US

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

H01S 3/13

US Classification:

372 29014, 372 29015, 372 55, 372 56, 372 59

Abstract:

A laser light source experiencing an EOL condition, which might otherwise cause an unscheduled shutdown, is instead operated in a diminished capacity in one or more predetermined or calculated increments. Operating in such diminished capacity continues until the laser system can undergo appropriate maintenance either during a regularly scheduled shutdown or a newly scheduled shutdown. In the meantime, the diminished capacity of the laser system is accommodated by the utilization tool, as appropriate.

US Patent:

8368041, Feb 5, 2013

Filed:

Mar 31, 2011

Appl. No.:

13/077958

Inventors:

Matthew R. Graham - San Diego CA, US
Olav Haugan - San Diego CA, US
William N. Partlo - San Diego CA, US

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

G21K 5/04
G03B 27/42

US Classification:

250504R, 355 30

Abstract:

A method and apparatus for compensating for thermal effects on the focal spot of a lens used to focus a laser beam on a target material at an irradiation site in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. The EUV energy output of the light system is measured at sample intervals as a proxy for the laser power. The thermal load on the focusing lens is estimated from the measured EUV power, the expected change in the focal length of the lens for the thermal load is calculated, and the lens position is adjusted to compensate for the calculated focal length change. The actual position of the lens may be determined and compared to its desired position, and adjusted to insure that it remains in the desired position.

US Patent:

8598552, Dec 3, 2013

Filed:

Jul 13, 2012

Appl. No.:

13/549261

Inventors:

Paul Frihauf - La Jolla CA, US
Daniel J. Riggs - San Diego CA, US
Matthew R. Graham - San Diego CA, US
Steven Chang - San Diego CA, US
Wayne J. Dunstan - San Diego CA, US

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

H05G 2/00
H01L 21/027
G03F 7/20

US Classification:

250504R, 355 71, 355 75

Abstract:

Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam can maintain focus on a target material to generate the plasma that gives off light. The system and method described herein optimize EUV light generation by using a closed-loop gradient process to track and fine-tune in real-time the positioning of optical elements that determine how the laser beam is focused on the target material. When real-time alignment of the drive laser on droplet position is achieved, EUV generation is optimized.

US Patent:

8648999, Feb 11, 2014

Filed:

Jul 22, 2010

Appl. No.:

12/841728

Inventors:

Matthew R. Graham - San Diego CA, US
William N. Partlo - Poway CA, US
Steven Chang - San Diego CA, US
Robert A. Bergstedt - Carlsbad CA, US

Assignee:

Cymer, LLC - San Diego CA

International Classification:

G01J 3/00

US Classification:

356 51

Abstract:

An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam.

US Patent:

20130043401, Feb 21, 2013

Filed:

Sep 30, 2011

Appl. No.:

13/249504

Inventors:

Matthew Graham - San Diego CA, US
Steven Chang - San Diego CA, US
Jim Crouch - San Diego CA, US
Igor Fomenkov - San Diego CA, US

Assignee:

CYMER, INC. - San Diego CA

International Classification:

G01J 1/42
G01J 1/16

US Classification:

250372, 250395

Abstract:

An apparatus includes a drive laser system producing an amplified light beam of pulses that travels along a drive axis; a beam delivery system that directs the amplified light beam of pulses toward a target region; a target material delivery system that provides a target mixture containing a target material in the target region; two or more sensors radially separated from a main axis that crosses the target region, the two or more sensors being configured to detect energy of ultraviolet electromagnetic radiation emitted from a plasma state of the target material when the amplified light beam of pulses intersects the target mixture; and a controller that receives the output from the two or more sensors. The controller is configured to estimate a relative radial alignment between the target mixture and the drive axis within the target region based on an analysis of the detected energy.

US Patent:

20190200442, Jun 27, 2019

Filed:

Feb 13, 2019

Appl. No.:

16/274378

Inventors:

- Veldhoven, NL
David Evans - San Diego CA, US
Matthew Graham - San Diego CA, US

International Classification:

H05G 2/00
G03F 7/20

Abstract:

A device and method are disclosed in which a source material delivery system can be reoriented so that the path of the source material is not directly towards an irradiation region in operating conditions in which the path is expected to be unpredictable. A shroud provided to protect the flow of source material from being disrupted is segmented so with one part of the shroud being movable with respect to another part of the shroud so that the movable part can avoid interfering with the path of the source material when it is not directly towards the irradiation region.

US Patent:

20180335701, Nov 22, 2018

Filed:

May 22, 2017

Appl. No.:

15/602028

Inventors:

- San Diego CA, US
Joshua Jon Thornes - San Diego CA, US
Kevin M. O'Brien - San Diego CA, US
Matthew Ryan Graham - San Diego CA, US

International Classification:

G03F 7/20

Abstract:

An optical lithography system is monitored. Information is received from the optical lithography system; a rule is accessed, the rule being associated with one or more of an event in the optical lithography system and an amount of time; a module stored in a library of modules is identified based on the accessed rule; whether a particular condition exists in the optical lithography system is determined using the identified module and the information received from the optical lithography system; and if the particular condition exists, a command signal is generated based on one or more characteristics of the particular condition and provided to an optical source of the optical lithography system. The command signal is based on the determined particular condition, and the command signal is sufficient to change one or more operating parameters of the optical source.

US Patent:

20180027642, Jan 25, 2018

Filed:

Sep 6, 2017

Appl. No.:

15/696508

Inventors:

- Veldhoven, NL
David Evans - San Diego CA, US
Matthew Graham - San Diego CA, US

International Classification:

H05G 2/00
G03F 7/20

Abstract:

A device and method are disclosed in which a source material delivery system can be reoriented so that the path of the source material is not directly towards an irradiation region in operating conditions in which the path is expected to be unpredictable. A shroud provided to protect the flow of source material from being disrupted is segmented so with one part of the shroud being movable with respect to another part of the shroud so that the movable part can avoid interfering with the path of the source material when it is not directly towards the irradiation region.