Wen Liu

US Patent:

6565719, May 20, 2003

Filed:

Jun 27, 2000

Appl. No.:

09/604490

Inventors:

Bruce Lairson - Los Altos CA
Ching Jackie Tsoi - Milpitas CA
Wen Liu - San Jose CA
Shigeto Hashimoto - Yamagata, JP
Eric Woo Hock Yong - Penang, MY
Tsutomu Tom Yamashita - San Jose CA

Assignee:

Komag, Inc. - San Jose CA

International Classification:

C23C 1434

US Classification:

20419216, 2041922, 20419238, 427131, 4272491, 4272496, 4272497, 4272498, 42724914, 427580, 427523, 427577, 427590

Abstract:

A method for making a magnetic disk comprises forming first and second protective carbon layers on a magnetic layer. The first protective carbon layer is predominantly SP3 carbon. The second protective carbon layer comprises about 50% or less SP3 carbon. The second protective carbon layer is very thin, e. g. between 0. 1 and 1. 0 nm thick. A lubricant layer (e. g. a perfluoropolyether lubricant) is applied to the second protective carbon layer. The second protective carbon layer facilitates improved cooperation between lubricant and the disk.

US Patent:

6682807, Jan 27, 2004

Filed:

Sep 26, 2002

Appl. No.:

10/255295

Inventors:

Bruce Lairson - Los Altos CA
Ching Jackie Tsoi - Milpitas CA
Wen Liu - San Jose CA
Shigeto Hashimoto - Yamagata, JP
Eric Woo Hock Yong - Penang, ML
Tsutomu Tom Yamashita - San Jose CA

Assignee:

Komag, Inc. - San Jose CA

International Classification:

G11B 572

US Classification:

428212, 428216, 428 655, 428408, 428694 TC

Abstract:

A method for making a magnetic disk comprises forming first and second protective carbon layers on a magnetic layer. The first protective carbon layer is predominantly SP3 carbon. The second protective carbon layer comprises about 50% or less SP3 carbon. The second protective carbon layer is very thin, e. g. between 0. 1 and 1. 0 nm thick. A lubricant layer (e. g. a perfluoropolyether lubricant) is applied to the second protective carbon layer. The second protective carbon layer facilitates improved cooperation between lubricant and the disk.

US Patent:

6753060, Jun 22, 2004

Filed:

Mar 27, 2002

Appl. No.:

10/106485

Inventors:

Jianwei Liu - Fremont CA
Michael Joseph Stirniman - Fremont CA
Wen Hong Liu - San Jose CA
Jing Gui - Fremont CA

Assignee:

Seagate Technology LLC - Scotts Valley CA

International Classification:

G11B 5725

US Classification:

428 654, 428421, 428704, 428694 TC, 428694 TF, 428336

Abstract:

A data/information storage and retrieval medium, comprising: (a) a disk-shaped substrate including at least one surface with a layer stack thereon and including at least one magnetic or magneto-optical (âMOâ) recording layer and an uppermost, protective overcoat layer comprising a carbon (C)-based material; and (b) a lubricant topcoat layer on the protective overcoat layer, the lubricant topcoat layer treated solely with UV radiation at a dosage sufficient to increase the glide yield, decrease the glide noise, and increase the number of CSS pass cycles of the medium before failure, relative to that of the same medium but with an untreated lubricant topcoat layer.

US Patent:

6815054, Nov 9, 2004

Filed:

Nov 13, 2001

Appl. No.:

09/986863

Inventors:

Wen Hong Liu - San Jose CA
Taesun Ernest Kim - San Jose CA
Chung Yuang Shih - Cupertino CA

Assignee:

Seagate Technology LLC - Scotts Valley CA

International Classification:

G11B 572

US Classification:

428336, 428408, 428694 TC, 428 655

Abstract:

A method of forming a layer of a hard, abrasion, and corrosion-resistant hydrogenated carbon (C:H) material on a substrate surface comprises steps of: (a) providing a vacuum chamber including a carbon sputtering target in the interior space thereof; (b) providing a substrate in the chamber interior space, a surface of the substrate the sputtering target; (c) supplying the vacuum chamber with at least one hydrocarbon gas and at least one inert gas at separately controllable flow rates and applying a sufficient negative potential to the carbon target to generate a plasma in said interior space to deposit a layer of the C:H material on the substrate surface by a process comprising simultaneous sputtering of the carbon sputtering target and plasma enhanced chemical vapor deposition (PECVD) of carbon and hydrogen from the hydrocarbon gas, wherein: step (c) includes separately controlling the flow rates of each of the hydrocarbon and inert gases such that the amount of C atoms in the C:H which are contributed by the PECVD component of the process is less than about 50 at. %. Embodiments of the invention include utilizing the C:H material as a protective overcoat layer for magnetic and magneto-optical recording media.

US Patent:

6855232, Feb 15, 2005

Filed:

Dec 5, 2003

Appl. No.:

10/728998

Inventors:

Ching Jackie Tsoi - Milpitas CA, US
Wen Liu - San Jose CA, US
Shigeto Hashimoto - Yamagata, JP
Eric Woo Hock Yong - Penang, ML
Tsutomu Tom Yamashita - San Jose CA, US

Assignee:

Komag, Inc. - San Jose CA

International Classification:

C23C014/34

US Classification:

20419216, 2041922, 20419238, 427131, 4272491, 4272496, 4272497, 4272498, 42724914, 427580, 427523, 427577, 427590

Abstract:

A method for making a magnetic disk comprises forming first and second protective carbon layers on a magnetic layer. The first protective carbon layer is predominantly SP3 carbon. The second protective carbon layer comprises about 50% or less SP3 carbon. The second protective carbon layer is very thin, e. g. between 0. 1 and 1. 0 nm thick. A lubricant layer (e. g. a perfluoropolyether lubricant) is applied to the second protective carbon layer. The second protective carbon layer facilitates improved cooperation between lubricant and the disk.

US Patent:

8105798, Jan 31, 2012

Filed:

Aug 13, 2004

Appl. No.:

10/918116

Inventors:

Xihua Cao - San Diego CA, US
Wen Liu - San Diego CA, US

Assignee:

The Burnham Institute - La Jolla CA

International Classification:

G01N 33/53

US Classification:

435 78, 435 795

Abstract:

This invention relates to methods for identifying agents useful for treatment of diseases and pathological conditions affected by Retinoid X Receptor apoptosis. The invention also relates to methods for treating diseases and pathological conditions affected by RXR apoptosis. The invention includes compositions that are useful in the study and treatment of diseases and pathological conditions affected by RXR apoptosis.

US Patent:

20110086834, Apr 14, 2011

Filed:

Jun 26, 2009

Appl. No.:

12/997868

Inventors:

Guoqing Chen - Palo Alto CA, US
Timothy D. Cushing - Pacifica CA, US
Paul Faulder - Cheshire, GB
Benjamin Fisher - San Mateo CA, US
Xiao He - Foster City CA, US
Kexue Li - Mountain View CA, US
Zhihong Li - Millbrae CA, US
Wen Liu - Foster City CA, US
Lawrence R. Mcgee - Pacifica CA, US
Vatee Pattaropong - Burlingame CA, US
Jennifer L. Seganish - Scotch Plains NJ, US
Youngshook Shin - Emeryville CA, US
Zhulun Wang - Palo Alto CA, US

Assignee:

AMGEN INC. - Thousand Oaks CA

International Classification:

A61K 31/506
C07D 413/14
C07D 403/14
C07D 401/14
C07D 417/14
C07D 413/04
C07D 403/04
C07D 409/14
C07D 491/107
C07D 498/10
C07D 473/16
C07D 487/04
C07D 407/14
C07D 239/48
C07D 471/10
C07D 495/10
C07D 487/14
A61K 31/497
A61K 31/433
A61K 31/53
A61K 31/4439
A61K 31/427
A61K 31/52
A61K 31/5377
A61K 31/505
A61K 31/519
A61K 31/55
A61P 35/00
A61P 35/02
A61P 37/06
A61P 11/06
A61P 17/00
A61P 19/02
A61P 25/28
A61P 11/00
A61P 1/00
A61P 29/00

US Classification:

51421016, 544324, 544295, 548128, 544405, 544209, 544230, 544 71, 544212, 5462697, 544277, 548181, 544333, 544122, 544331, 544323, 544247, 540521, 544131, 544328, 514275, 51425505, 514361, 514245, 514256, 5142305, 514339, 514365, 5142632, 5142352, 514257, 51421206, 5142372

Abstract:

Selected compounds are effective for prophylaxis and treatment of inflammation and inflammatory disorders, such as NIK-mediated disorders. The invention encompasses novel compounds, analogs, prodrugs and pharmaceutically acceptable salts thereof, pharmaceutical compositions and methods for prophylaxis and treatment of diseases and other maladies or conditions involving, inflammation and the like.

US Patent:

60867302, Jul 11, 2000

Filed:

Apr 22, 1999

Appl. No.:

9/298107

Inventors:

Wen Hong Liu - San Jose CA
Gang Peng - Milpitas CA
Tsutomu Yamashita - San Jose CA
Tu Chen - Monte Sereno CA

Assignee:

Komag, Incorporated - San Jose CA

International Classification:

C23C 1434

US Classification:

20419216

Abstract:

Sputtering method for producing amorphous hydrogenated carbon thin films with high sp. sup. 3 content. By sputtering the carbon with a pulsed DC power supply having high voltage peaks, a carbon film with remarkably high sp. sup. 3 bonding fraction can be obtained. Previously, carbon films with a very high sp. sup. 3 fraction film with content as high (e. g. as 80%) could only be produced by methods such as filtered cathodic arc deposition or chemical vapor deposition methods (CVD) such as plasma-enhanced chemical vapor deposition (PE-CVD) and ion-beam deposition operating at some narrowly defined range of deposition conditions. It is very advantageous to use sputtering to create a high sp. sup. 3 content film, since sputtering is more manufacturable and has higher productivity compared to CVD or ion-beam deposition methods. The resultant carbon film has excellent durability and corrosion resistance capability down to very low thickness.