David L. Rhodes - Brick NJ Xiaojia J. Lu - Nutley NJ Dwight L. Woolard - Neptune NJ
Assignee:
The United States of America as represented by the Secretary of the Army - Washington DC
International Classification:
H01L 21283
US Classification:
438619
Abstract:
A method of using layers of gold metallization and a thick film coating of photo-sensitive material to form an air-filled microwave waveguide structure on the outer surface of a semiconductor body, such as a monolithic microwave integrated circuit commonly referred to as an MMIC, so that the waveguide can be coupled to the active and passive devices of the MMIC. First, a patterned metallization layer is formed on a substrate. A mold of a waveguide is fabricated by masking and then etching another metallization layer. The mold is turned over face down on the patterned metallization layer and bonded to the patterned metallization layer, Then, any unnecessary material is etched away.