Yi Y Liu

US Patent:

6343511, Feb 5, 2002

Filed:

Aug 9, 1999

Appl. No.:

09/370767

Inventors:

Lawrence C. Lynnworth - Waltham MA
Yi Liu - Bolton MA

Assignee:

Panametrics, Inc. - Waltham MA

International Classification:

G01N 2928

US Classification:

73644, 7386118

Abstract:

An encapsulated or rigid bundle of rods forms a substantially non-dispersive buffer usable in extreme environments, operable over wide bandwidth, and repairable in the field. The rigid assembly extends through a nozzle or flanged pipe penetration to launch its signals directly in the fluid at a defined angle. The bundles are non-degrading wave guides to carry signals through degrading environments. This is useful for numerous stack, freestream and chordal path configurations, as well as clamp-on systems and special mode-converting configurations. Beam shaping and steering may be passively effected with patterned bundle constructions, and plural faces, which may be stepped or angled, may define multiple oblique, reflective or different length paths while mounted in spoolpieces at normal incidence.

US Patent:

6349599, Feb 26, 2002

Filed:

May 2, 2000

Appl. No.:

09/563474

Inventors:

Lawrence C. Lynnworth - Waltham MA
Yi Liu - Bolton MA

Assignee:

Panametrics, Inc. - Waltham MA

International Classification:

G01N 2900

US Classification:

73644

Abstract:

An ultrasonic coupling assembly includes a barrier layer that contacts the wall, and a generally thicker layer formed of a compliant material such as zinc foil that extends over the first layer. A third layer may cover and enclose the compliant layer, e. g. , by folding the first layer over and on top of the second layer to cover the edge faces thereof. An exemplary embodiment is implemented using gold foil approximately one mil thick for the first layer, and zinc sheeting approximately four mils thick for the second layer. Use of inert top and bottom, or outside, layers prevents the inadvertent installation of the coupling element with the compliant layer directly contacting the wall. Disk embodiments may employ a stack of separate disks formed of foils or sheets of the respective materials. For cryogenic applications, a material such as indium may be used for the second layer without risk of its alloying or migration through the first layer.

US Patent:

6639087, Oct 28, 2003

Filed:

Aug 22, 2002

Appl. No.:

10/225902

Inventors:

Jay F. Larrow - Wakefield MA
Serge Jasmin - Watertown MA
Yi Liu - Weymouth MA
Marcello Di Mare - Belmont MA

Assignee:

Rhodia Pharma Solutions Inc. - Cranbury NJ

International Classification:

C07D30132

US Classification:

549541, 549513, 549540, 502150, 502170, 502171

Abstract:

A method for stereoselective chemical synthesis, includes the steps of: (A) reacting a nucleophile and chiral or prochiral cyclic subtrate, said substrate comprising a carbocycle or a heterocycle having a reactive center susceptible to nucleophilic attack by the nucleophile, in the presence of a chiral non-racemic catalyst to produce a product mixture comprising a stereomerically enriched product wherein the product mixture further comprises a catalyst residue, at least a portion of the catalyst residue is in a first oxidation state, and the catalyst residue in the first oxidation state is active in catalyzing degradation of the stereoisomerically enriched product, and (B) chemically or electochemically changing the oxidation state of the catalyst residue from the first oxidation state to a second oxidation state, wherein catalyst residue in the second oxidation state is less active in catalyzing degradation of the stereoisomerically enriched product than is catalyst residue in the first oxidation state. The method reduces erosion of the chiral purity of the stereoisomerically enriched product and reduces the chemical transformation to side products of the stereoisomerically enriched product and co-product(s). The deactivated catalyst is recoverable and recyclable.

US Patent:

6693206, Feb 17, 2004

Filed:

Aug 22, 2002

Appl. No.:

10/225869

Inventors:

Yi Liu - Weymouth MA
Marcello DiMare - Belmont MA
Salvatore Anthony Marchese - Malden MA
Eric N. Jacobsen - Boston MA
Serge Jasmin - Watertown MA

Assignee:

Rhodia Chirex, Inc. - MA

International Classification:

C07D30132

US Classification:

549541, 549513, 549540

Abstract:

The present invention provides a process for the preparation of an enantiomerically enriched non-racemic chiral diol and an enantiomerically enriched non-racemic chiral epoxy compound by a hydrolytic kinetic resolution reaction. The process includes the step of contacting oxygen and mixture including a racemic chiral epoxy compound, a non-racemic Co(II) complex catalyst, an aromatic carboxylic acid and water, at a temperature and length of time sufficient to produce a mixture of said non-racemic chiral diol and said non-racemic chiral epoxy compound. The present invention also provides a process for the preparation of an enantiomerically enriched non-racemic chiral diol and an enantiomerically enriched non-racemic chiral epoxy compound by a hydrolytic kinetic resolution reaction. This process includes the step of: contacting a racemic chiral epoxy compound and water in the presence of a non-racemic complex of Co(III) having an aryl carboxylate counter-anion, at a temperature and length of time sufficient to produce a mixture of said non-racemic chiral diol and said non-racemic chiral epoxy compound.

US Patent:

8096171, Jan 17, 2012

Filed:

Nov 5, 2009

Appl. No.:

12/613302

Inventors:

Joachim Konrad - Weil der Stadt, DE
Yi Liu - Northville MI, US
Emmanuel Routier - Stuttgart, DE
Kevin Sisken - Saline MI, US
Patrick Wolf - Gaeufelden, DE
Peter Schimmelpfennig - Erlangen, DE

Assignee:

Daimler AG - Stuttgart
Conti Temic microelectronic GmbH - Nuremberg

International Classification:

G01M 15/10

US Classification:

7311476

Abstract:

In a method for the diagnostics of an internal combustion engine exhaust gas system that includes a particle filter, first and second sets of value vectors are determined, each including associated values for absolute pressure upstream and downstream of the particle filter, a differential pressure determined from the values of the absolute pressure, an exhaust gas volume flow through the particle filter, and a temperature of the exhaust gas volume flow. After a temperature-standardization of the pressure values, characteristics for dependence of the pressure values are generated from temperature-standardized values of the first set of value vectors and possibly stored as reference characteristics. By comparing temperature-standardized values for the absolute pressure on the inlet and outlet sides of the particle filter and the differential pressure of the second set of value vectors with reference characteristics, flow anomalies can be determined in the exhaust gas system.

US Patent:

8338079, Dec 25, 2012

Filed:

Jun 28, 2010

Appl. No.:

12/825124

Inventors:

Young Cheol Bae - Weston MA, US
Thomas Cardolaccia - Newton MA, US
Yi Liu - Shrewsbury MA, US

Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA

International Classification:

G03F 7/00
G03F 7/004
G03F 7/40

US Classification:

4302711, 4302701, 4302731, 430322, 430319, 430330, 430331

Abstract:

Compositions are provided which can be used for treating photoresist patterns in the manufacture of electronic devices. The compositions allow for the formation of fine lithographic patterns and find particular applicability in semiconductor device manufacture.

US Patent:

8338083, Dec 25, 2012

Filed:

Jun 28, 2010

Appl. No.:

12/825157

Inventors:

Young Cheol Bae - Weston MA, US
Thomas Cardolaccia - Newton MA, US
Yi Liu - Wayland MA, US

Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA

International Classification:

G03F 7/00
G03F 7/004
G03F 7/40
G03F 7/20

US Classification:

430312, 4302701, 4302731, 430330, 430322, 430331, 430913

Abstract:

Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.

US Patent:

8375700, Feb 19, 2013

Filed:

Mar 30, 2010

Appl. No.:

12/750088

Inventors:

Kevin Dean Sisken - Saline MI, US
Yi Liu - Northville MI, US

Assignee:

Detroit Diesel Corporation - Detroit MI

International Classification:

F01N 3/00

US Classification:

60277, 60274, 60286, 60295, 60301

Abstract:

Method and apparatus for evaluating an ammonia conversion efficiency of an ammonia oxidation (AMOX) catalyst for reducing ammonia and hydrocarbons present in an exhaust gas stream. The AMOX associated with an exhaust gas after-treatment system has a selective catalytic reduction (SCR) catalyst for reducing nitrogen oxides (NO) present in the exhaust gas stream and a dosing system for introducing a reductant into the exhaust gas stream for reacting with the nitrogen oxides in the presence of the SCR catalyst. The AMOX catalyst is arranged downstream of the SCR catalyst.