Yong D Liu

US Patent:

6670082, Dec 30, 2003

Filed:

Oct 9, 2001

Appl. No.:

09/974507

Inventors:

Yong Liu - Fremont CA
Hua-Yu Liu - Palo Alto CA

Assignee:

Numerical Technologies, Inc. - Mountain View CA

International Classification:

G03F 900

US Classification:

430 5, 716 19

Abstract:

An accurate, cost-effective system and method for correcting 3D effects on an alternating phase-shifting mask (PSM) is provided. To facilitate this correction, a library can be built to include a first group of 180 degree phase-shifting regions, wherein these regions have a common first size. Based on this first size, 3D simulation is performed. A transmission and a phase are altered in a 2D simulation based on this first size until a shape dependent transmission and a shape dependent phase allow the 2D simulation to substantially match the 3D simulation. Finally, a modified first size is chosen using the shape dependent transmission and the shape dependent phase such that a 2D simulation based on the modified first size substantially matches the 3D simulation based on the first size. The library associates the first size with the modified first size, the shape dependent transmission, and the shape dependent phase.

US Patent:

6830854, Dec 14, 2004

Filed:

Oct 14, 2003

Appl. No.:

10/685751

Inventors:

Yong Liu - Fremont CA
Hua-Yu Liu - Palo Alto CA

Assignee:

Numerical Technologies, Inc. - Mountain View CA

International Classification:

G03F 900

US Classification:

430 5

Abstract:

An accurate, cost-effective system and method for correcting 3D effects on an alternating phase-shifting mask (PSM) is provided. To facilitate this correction, a library can be built to include a first group of 180 degree phase-shifting regions, wherein these regions have a common first size. Based on this first size, 3D simulation is performed. A transmission and a phase are altered in a 2D simulation based on this first size until a shape dependent transmission and a shape dependent phase allow the 2D simulation to substantially match the 3D simulation. Finally, a modified first size is chosen using the shape dependent transmission and the shape dependent phase such that a 2D simulation based on the modified first size substantially matches the 3D simulation based on the first size. The library associates the first size with the modified first size, the shape dependent transmission, and the shape dependent phase.

US Patent:

7793253, Sep 7, 2010

Filed:

Oct 4, 2006

Appl. No.:

11/538782

Inventors:

Daniel S. Abrams - Mountain View CA, US
Danping Peng - Fremont CA, US
Yong Liu - Fremont CA, US
Paul Rissman - Palo Alto CA, US

Assignee:

Luminescent Technologies, Inc. - Palo Alto CA

International Classification:

G06F 17/50

US Classification:

716 19, 716 21

Abstract:

A method for determining a mask pattern to be used on a photo-mask in a photolithographic process is described. During the method, a target pattern that includes at least one continuous feature is provided. Then a mask pattern that includes a plurality of distinct types of regions corresponding to the distinct types of regions of the photo-mask is determined. Note that the mask pattern includes at least two separate features corresponding to at least the one continuous feature. Furthermore, at least the two separate features are separated by a spacing having a length and the spacing overlaps at least a portion of at least the one continuous feature.

US Patent:

8082525, Dec 20, 2011

Filed:

Apr 14, 2009

Appl. No.:

12/423693

Inventors:

Yong Liu - Fremont CA, US
John F. McCarty - Redwood City CA, US
Kelly Gordon Russell - Santa Clara CA, US
Linyong Pang - Palo Alto CA, US

Assignee:

Luminescent Technologies, Inc. - Palo Alto CA

International Classification:

G06F 17/50
G06F 19/00
G03F 1/00
G21K 5/00

US Classification:

716 52, 716 53, 716 54, 716 55, 716111, 700120, 700121, 430 5, 378 35

Abstract:

Embodiments of a method for determining a mask pattern to be used on a photo-mask in a lithography process are described. This method may be performed by a computer system. During operation, this computer system receives at least a portion of a first mask pattern including first regions that violate pre-determined rules associated with the photo-mask. Next, the computer system determines a second mask pattern based on at least the portion of the first mask pattern, where the second mask pattern includes second regions that are estimated to comply with the pre-determined rules. Note that the second regions correspond to the first regions, and the second mask pattern is determined using a different technique than that used to determine the first mask pattern.

US Patent:

8231431, Jul 31, 2012

Filed:

Jan 23, 2009

Appl. No.:

12/358814

Inventors:

Dhruv Gajaria - Sunnyvale CA, US
Zhiyong Li - San Jose CA, US
Gopalakrishna B. Prabhu - San Jose CA, US
Yacov Elgar - Sunnyvale CA, US
John Visitacion - Newark CA, US
Yong Liu - San Jose CA, US
Jeffrey S. Sullivan - Castro Valley CA, US
Salvador Umotoy - Antioch CA, US
Tai T. Ngo - Dublin CA, US
Michael Marriott - Morgan Hill CA, US
Peter Crundwell - Horsham, GB
Vinay Shah - San Mateo CA, US
Ho Gene Choi - Santa Clara CA, US
Dennis C. Pierce - Pleasanton CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

B24B 49/00
B24B 7/06
B24B 53/21

US Classification:

451 8, 451 21, 451194, 451213, 451443

Abstract:

The present invention generally relates to an edge deletion module positioned within an automated solar cell fabrication line. The edge deletion module may include a grinding wheel device for removing material from edge regions of a solar cell device and cleaning the edge regions of the solar cell device after removing the material. The edge deletion module may also include an abrasive element, a portion of which is ground as it is periodically, laterally advanced toward the grinding wheel device. A controller is provided for controlling the operation and function of various facets of the module.

US Patent:

8270909, Sep 18, 2012

Filed:

Mar 30, 2010

Appl. No.:

12/750636

Inventors:

Hongyuan Zhang - Fremont CA, US
Hui-Ling Lou - Sunnyvale CA, US
Rohit U. Nabar - Sunnyvale CA, US
Yong Liu - Santa Clara CA, US

Assignee:

Marvell World Trade Ltd. - St. Michael

International Classification:

H04B 1/00
H04B 7/00

US Classification:

455 69, 455 631, 455 6711, 370334, 370346, 375260

Abstract:

The present disclosure includes systems, apparatuses, and techniques relating to wireless local area network devices. Systems, apparatuses, and techniques include communicating with multiple wireless communication devices to determine characteristics of spatial wireless channels, determining steering matrices based on one or more outputs of the communicating, and transmitting signals that concurrently provide data to the wireless communication devices via different spatial wireless channels. The signals can be spatially steered to the wireless communication devices based on the steering matrices.

US Patent:

8335167, Dec 18, 2012

Filed:

Feb 2, 2010

Appl. No.:

12/698810

Inventors:

Hongyuan Zhang - Fremont CA, US
Hui-Ling Lou - Sunnyvale CA, US
Yong Liu - Santa Clara CA, US
Songping Wu - Cupertino CA, US

Assignee:

Marvell International Ltd. - Hamilton

International Classification:

H04B 7/00

US Classification:

370252, 455 69

Abstract:

Refining beamforming techniques for use in a communication system. In one embodiment, a method for beamforming in a communication system includes generating multiple training signals to be transmitted via multiple antennas over a communication channel, including applying a different antenna weight vector (AWV) to each of the multiple training signals. The method further includes receiving feedback generated using the multiple training signals, where the feedback includes a transmitter AWV for use with the multiple antennas and/or channel state information (CSI) descriptive of the communication channel.

US Patent:

8395997, Mar 12, 2013

Filed:

Nov 12, 2010

Appl. No.:

12/945805

Inventors:

Raja Banerjea - Sunnyvale CA, US
Yong Liu - Campbell CA, US
Hongyuan Zhang - Fremont CA, US
Harish Ramamurthy - Sunnyvale CA, US
Sudhir Srinivasa - Sunnyvale CA, US

Assignee:

Marvell World Trade Ltd. - St. Michael

International Classification:

G01R 31/08

US Classification:

370241, 370310

Abstract:

Systems and techniques relating to wireless communications are described. A described technique includes monitoring wireless communication channels, including a first channel and a second channel, to produce a monitoring output, determining a first transmission period for the first channel, determining a second transmission period for the second channel, transmitting, based on the first transmission period, a first packet on the first channel to cause one or more wireless communication devices to set a transmission protection period for the first channel and the second channel based on a reception of the first packet, transmitting, based on the second transmission period, a second packet on the second channel, and monitoring, after the end of the first transmission period, for one or more acknowledgements. An end of the second transmission period can be aligned with an end of the first transmission period.