Clarence Kai Hsieh

US Patent:

20070124917, Jun 7, 2007

Filed:

Dec 7, 2005

Appl. No.:

11/297228

Inventors:

Daniel Bedell - Gilroy CA, US
Mary Gutberlet - Prunedale CA, US
Clarence Hsieh - Santa Barbara CA, US
Aron Pentek - San Jose CA, US
Yi Zheng - San Ramon CA, US

International Classification:

G11B 5/127
H04R 31/00

US Classification:

029603140, 029603110, 029603120

Abstract:

A method of manufacturing a magnetic write head that provides improved pole critical dimension control, such as improved track width control (improved sigma) and improved flare point control. The method involves a combination of several process improvements, such as photolithographically patterning a Ppole tip defining photoresist frame using a zero print bias and also using a small flash field. The method also involves the use of a non-reactive ion etch to notch the first pole (P) using the second pole (P) as a mask.